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ST0486 Gold Palladium Sputtering Target, Au/Pd

Chemical Formula: Au/Pd
Catalog Number: ST0486
Purity: 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Gold Palladium sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

Introduction

Gold Palladium (Au/Pd) Sputtering Targets are premium noble metal alloy targets widely used in thin film deposition processes where excellent electrical conductivity, chemical stability, and fine surface morphology are required. By combining gold’s superior conductivity with palladium’s hardness and structural refinement, Au/Pd targets deliver high-performance coatings for precision applications such as electron microscopy, microelectronics, and sensor technologies.

Detailed Description

Gold Palladium Sputtering Targets are produced using high-purity raw materials through vacuum induction melting or powder metallurgy routes, ensuring excellent compositional uniformity and structural integrity. The alloy ratio can be precisely controlled—commonly Au:Pd = 60:40 or 80:20 (wt%)—to tailor film characteristics such as grain size, hardness, and conductivity.

One of the key advantages of Au/Pd over pure gold is its refined microstructure. Palladium acts to reduce grain size during deposition, resulting in smoother, more uniform coatings. This is particularly critical in scanning electron microscopy (SEM), where fine-grained conductive coatings minimize charging effects and enhance imaging resolution.

Au/Pd films exhibit excellent adhesion to a wide range of substrates, including polymers, glass, and ceramics. Additionally, the alloy offers improved mechanical durability and wear resistance compared to pure gold, while maintaining strong resistance to oxidation and corrosion.

Targets are available in planar and rotatable forms, and are typically bonded to copper backing plates using indium or elastomer bonding to enhance thermal conductivity and ensure stable sputtering under high power conditions. A dense, fine-grained microstructure (≥99% theoretical density) is essential for minimizing particle generation and ensuring consistent film deposition.

Applications

Gold Palladium Sputtering Targets are widely used in:

  • Conductive coatings for SEM and electron microscopy sample preparation
  • Thin film circuits and microelectronic devices
  • Biosensors and chemical sensor coatings
  • Optical coatings and reflective layers
  • Decorative coatings with enhanced durability
  • Corrosion-resistant conductive films

Technical Parameters

ParameterTypical Value / RangeImportance
CompositionAu/Pd (e.g., 60/40, 80/20 wt%)Controls film conductivity and morphology
Purity≥ 99.95%Ensures high film quality and low contamination
Density≥ 99% theoreticalImproves sputtering stability and lifetime
Diameter25 – 200 mm (custom available)Fits standard sputtering systems
Thickness2 – 6 mmAffects deposition rate and target life
BondingCu backing / Indium bondingEnhances heat dissipation and stability
Grain StructureFine and homogeneousEnsures smooth, defect-free coatings

Comparison with Related Materials

MaterialKey AdvantageTypical Application
Gold Palladium (Au/Pd)Fine grain, durable, stable filmsSEM coatings, sensors
Gold (Au)Highest conductivityMicroelectronics, bonding layers
Palladium (Pd)Higher hardness, catalytic activitySensors, catalytic coatings

FAQ

QuestionAnswer
Can Au/Pd sputtering targets be customized?Yes, composition ratio, dimensions, and bonding methods can all be tailored.
Why is Au/Pd preferred for SEM coatings?It produces ultra-fine grain films that reduce charging and improve imaging clarity.
What sputtering method is suitable?DC magnetron sputtering is commonly used due to the metallic nature of the alloy.
Are bonded targets necessary?For high-power or precision applications, bonded targets are recommended for better heat management.
What industries use Au/Pd targets most?Electronics, microscopy, sensor development, and advanced research laboratories.

Packaging

Our Gold Palladium Sputtering Target are meticulously tagged and labeled externally to ensure efficient identification and maintain high standards of quality control. We take great care to prevent any potential damage during storage and transportation, ensuring the targets arrive in perfect condition.

Conclusion

Gold Palladium Sputtering Targets offer a superior combination of conductivity, surface smoothness, and durability, making them ideal for precision thin film deposition. With flexible composition options and reliable manufacturing quality, Au/Pd targets are a trusted choice for both industrial production and advanced R&D applications.

For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

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FAQ

It’s the source material (in solid form) used in sputter deposition to eject atoms or molecules that then form a thin film on a substrate.

Targets can be pure metals (e.g., gold, copper, aluminum), ceramics (e.g., Al₂O₃, SiO₂, TiO₂), alloys, or composites—chosen based on the film’s desired properties.

 

They are produced by processes such as melting/casting for metals or sintering (often with hot isostatic pressing) for ceramics and composite targets to ensure high density and purity.

 

In a vacuum chamber, a plasma (typically argon) bombards the target, ejecting atoms that travel and condense on a substrate, forming a thin film.

 

Key factors include the target’s purity, density, grain structure, and the sputtering yield (i.e. how many atoms are ejected per incident ion), as well as operating conditions like power density and gas pressure.

 

Operators monitor target erosion (often by measuring the depth of the eroded “race track”) or track total energy delivered (kilowatt-hours) until it reaches a threshold that can compromise film quality.

 

Fragile materials (such as many ceramics or certain oxides) and precious metals often require a backing plate to improve cooling, mechanical stability, and to allow thinner targets that reduce material costs.

 

DC sputtering is used for conductive targets, while RF sputtering is necessary for insulating targets (like many oxides) because it prevents charge buildup on the target’s surface.

 

In reactive sputtering, a reactive gas (e.g., oxygen or nitrogen) is introduced to form compound films on the substrate, but it may also “poison” the target surface if not carefully controlled.

 

Many manufacturers prefer to control raw material quality by sourcing their own powders; using external powders can risk impurities and inconsistent target properties.

 

Targets should be stored in clean, dry conditions (often in original packaging or re-wrapped in protective materials) and handled with gloves to avoid contamination, ensuring optimal performance during deposition.

Deposition rate depends on factors such as target material and composition, power density, working gas pressure, substrate distance, and the configuration of the sputtering system (e.g., magnetron design).

 
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