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ST0163A Lanthanum Praseodymium Calcium Manganate Sputtering Targets (La(1-x-y)PrxCayMnO3)

MSDS File
Material TypeLanthanum Praseodymium Calcium Manganate
SymbolLa(1-x-y)PrxCayMnO3
Color/AppearanceVarious colors, Solid
Melting Point (°C)N/A
Theoretical Density (g/cc)N/A
Water SolubilityInsoluble
SputterRF, RF-R, DC
Max Power Density*
(Watts/Square Inch)		N/A
Type of BondIndium, Elastomer

Lanthanum Praseodymium Calcium Manganate Sputtering Target

Overview

Lanthanum Praseodymium Calcium Manganate (LPCMO) sputtering targets are known for their exceptional properties, making them ideal for advanced electronic applications. With a high purity of 99.9%, these targets are suitable for a wide range of applications, including ferroelectrics, gate dielectrics, and CMOS technology. They offer enhanced performance for devices requiring stable and durable thin film deposition.

Lanthanum Praseodymium Calcium Manganate Sputtering Targets Information

  • Purity: 99.9%
  • Available Shapes:
    • Circular: Diameter ≤ 14 inches, Thickness ≥ 1 mm
    • Block: Length ≤ 32 inches, Width ≤ 12 inches, Thickness ≥ 1 mm
  • Bonding: Elastomer bonding recommended to ensure target stability and uniform deposition.
  • Sputtering Options: RF, DC

Applications of Lanthanum Praseodymium Calcium Manganate Sputtering Targets

  • Ferroelectric Materials
  • Gate Dielectrics
  • For CMOS Devices

Features

  • High Purity: Ensures consistent and reliable performance in sensitive applications.
  • Custom Sizes Available: Tailored to meet the specific requirements of your project.

Manufacturing Process

  • Cold Pressing & Sintering: Targets are cold-pressed and sintered to ensure high density and optimal material integrity.
  • Elastomer Bonding: Elastomer bonding is applied to the backing plate to enhance stability during sputtering.
  • Cleaning & Final Packaging: The targets are cleaned for use in vacuum environments and protected from contaminants during shipment.

Options Available

  • Purity: 99.9% minimum purity for superior consistency.
  • Smaller Sizes for R&D: Available for research and development applications.
  • Sputtering Target Bonding Service: Custom bonding services available for enhanced performance.

For more information or to place an order, feel free to contact us.

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FAQ

It’s the source material (in solid form) used in sputter deposition to eject atoms or molecules that then form a thin film on a substrate.

Targets can be pure metals (e.g., gold, copper, aluminum), ceramics (e.g., Al₂O₃, SiO₂, TiO₂), alloys, or composites—chosen based on the film’s desired properties.

 

They are produced by processes such as melting/casting for metals or sintering (often with hot isostatic pressing) for ceramics and composite targets to ensure high density and purity.

 

In a vacuum chamber, a plasma (typically argon) bombards the target, ejecting atoms that travel and condense on a substrate, forming a thin film.

 

Key factors include the target’s purity, density, grain structure, and the sputtering yield (i.e. how many atoms are ejected per incident ion), as well as operating conditions like power density and gas pressure.

 

Operators monitor target erosion (often by measuring the depth of the eroded “race track”) or track total energy delivered (kilowatt-hours) until it reaches a threshold that can compromise film quality.

 

Fragile materials (such as many ceramics or certain oxides) and precious metals often require a backing plate to improve cooling, mechanical stability, and to allow thinner targets that reduce material costs.

 

DC sputtering is used for conductive targets, while RF sputtering is necessary for insulating targets (like many oxides) because it prevents charge buildup on the target’s surface.

 

In reactive sputtering, a reactive gas (e.g., oxygen or nitrogen) is introduced to form compound films on the substrate, but it may also “poison” the target surface if not carefully controlled.

 

Many manufacturers prefer to control raw material quality by sourcing their own powders; using external powders can risk impurities and inconsistent target properties.

 

Targets should be stored in clean, dry conditions (often in original packaging or re-wrapped in protective materials) and handled with gloves to avoid contamination, ensuring optimal performance during deposition.

Deposition rate depends on factors such as target material and composition, power density, working gas pressure, substrate distance, and the configuration of the sputtering system (e.g., magnetron design).

 
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