Sputtering Target
Sputtering Target
Sputtering Targets are essential components in the thin-film deposition process, widely utilized in various industries for creating high-quality, uniform coatings. In the sputtering process, a target material is bombarded with high-energy particles, causing atoms or molecules to be ejected from the target’s surface and then deposited onto a substrate. This technique is critical for producing thin films in applications such as semiconductor manufacturing, solar cells, data storage devices, and advanced optical coatings.
Sputtering target materials can vary widely to suit different applications, including metals, alloys, compounds, and ceramics. Sputtering targets are available in both planar and rotary shapes, accommodating various deposition requirements.
The process of attaching the sputtering target to a backing plate, is crucial to ensure efficient heat dissipation and structural integrity during the sputtering process. This combination of diverse materials and precise bonding techniques makes sputtering targets indispensable in modern technology fabrication.
The process of attaching the sputtering target to a backing plate, is crucial to ensure efficient heat dissipation and structural integrity during the sputtering process. This combination of diverse materials and precise bonding techniques makes sputtering targets indispensable in modern technology fabrication.
Planar Sputtering Targets
Rotary Sputtering Targets
Aluminum (Al) Rotary Sputtering Target
TFM manufactures customizable aluminum rotary sputtering targets for conductive films, capacitor films, and thin-film technologies.
Aluminum-doped Zinc Oxide (AZO) Rotary Sputtering Target
TFM offers high-quality AZO rotary sputtering targets, ideal for thin-film solar cells, Low-E glass, automotive glass, and flat panel displays. These targets can be customized to meet precise application requirements.
Chromium (Cr) Rotary Sputtering Target
TFM produces high-purity rotatable chromium sputtering targets (99.5%-99.95%) with customization for precision applications.
Copper (Cu) Rotary Sputtering Target
TFM offers high-performance copper (Cu) rotary sputtering targets with excellent thermal/electrical conductivity and ductility.
Indium Tin Oxide (ITO) Rotary Sputtering Target
Indium Tin Oxide (ITO) Rotary Sputtering Targets are widely used to form electrically transparent thin films. TFM produces it with...
Molybdenum (Mo) Rotary Sputtering Target
TFM produces 99.95% pure molybdenum rotary sputtering targets, customizable for vacuum coatings, semiconductors, and thin-film technologies.
Niobium (Nb) Rotary Sputtering Target
TFM offers 99.95% pure niobium rotary sputtering targets in custom sizes/shapes for optical glass coatings, semiconductors, and thin-film technologies.
Niobium Oxide (Nb2Ox) Rotary Sputtering Target
TFM manufactures Niobium Oxide rotary sputtering targets in customized sizes and shapes, ideal for Low-E glass film systems.
Silicon (Si) Rotary Sputtering Target
TFM offers monocrystalline and polycrystalline silicon rotary sputtering targets, customizable for thin-film and semiconductor applications.
Titanium (Ti) Rotary Sputtering Target
TFM manufactures high-purity rotatable titanium sputtering targets (99.5%-99.999%) with customization for optimal performance.
Titanium Oxide (TiOx) Rotary Sputtering Target
TFM's Titanium Oxide (TiOx) Rotary Sputtering Targets are extensively used in photovoltaic glass, optical glass, construction, and automotive applications.
Zirconium (Zr) Rotary Sputtering Target
TFM provides high-quality zirconium rotary sputtering targets with excellent hardness, ductility, and corrosion resistance.