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ST0513 Chromium Trioxide Sputtering Target, CrO3

Chemical Formula: CrO3
Catalog Number: ST0513
CAS Number: 1333-82-0
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Chromium Trioxide sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Chromium Trioxide Sputtering Target Description

Chromium

Chromium, derived from the Greek word ‘chroma,’ meaning color, has been used since ancient times and was discovered by the Terracotta Army. Represented by the symbol Cr, it has an atomic number of 24, is located in Period 4 and Group 6 of the periodic table, and belongs to the d-block. Its relative atomic mass is 51.9961(6) Dalton.

Applications: Chromium is extensively used in the automotive industry for creating shiny coatings on wheels and bumpers. It is also employed in various vacuum applications, including automotive glass coatings, photovoltaic cell fabrication, battery production, and decorative as well as corrosion-resistant coatings.

Related Product: Chromium Sputtering Target.

Chromium Trioxide Sputtering Target Specifications

Material TypeChromium Trioxide
SymbolCrO3
Color/AppearanceSolid
Melting Point/
Density/
Available SizesDia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets; please Contact Us for more information.

Chromium Trioxide Sputtering Target Applications

Thin-Film Coatings: Chromium trioxide sputtering targets deposit chromium oxide thin films, offering excellent corrosion resistance and thermal stability for electronic components and optical lenses.

Optical Coatings: Chromium oxide films are utilized in optical applications, such as anti-reflective coatings on lenses and components, enhancing light transmission and reducing glare.

Decorative Coatings: Applied in automotive, jewelry, and architectural industries, chromium oxide coatings provide attractive, durable finishes that resist abrasion and environmental damage.

Solar Panels: Sputtering targets improve solar panel efficiency by reducing reflection and enhancing light absorption, leading to better energy conversion.

Gas Sensors: Chromium oxide films serve as gas-sensitive layers in sensors, aiding in gas detection and environmental monitoring.

Electrochromic Devices: Used in smart windows and mirrors, these coatings adjust transparency with electrical voltage, offering glare reduction and privacy control.

Chromium Trioxide Sputtering Target Packing

Our Chromium Trioxide Sputtering Targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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FAQ

It’s the source material (in solid form) used in sputter deposition to eject atoms or molecules that then form a thin film on a substrate.

Targets can be pure metals (e.g., gold, copper, aluminum), ceramics (e.g., Al₂O₃, SiO₂, TiO₂), alloys, or composites—chosen based on the film’s desired properties.

 

They are produced by processes such as melting/casting for metals or sintering (often with hot isostatic pressing) for ceramics and composite targets to ensure high density and purity.

 

In a vacuum chamber, a plasma (typically argon) bombards the target, ejecting atoms that travel and condense on a substrate, forming a thin film.

 

Key factors include the target’s purity, density, grain structure, and the sputtering yield (i.e. how many atoms are ejected per incident ion), as well as operating conditions like power density and gas pressure.

 

Operators monitor target erosion (often by measuring the depth of the eroded “race track”) or track total energy delivered (kilowatt-hours) until it reaches a threshold that can compromise film quality.

 

Fragile materials (such as many ceramics or certain oxides) and precious metals often require a backing plate to improve cooling, mechanical stability, and to allow thinner targets that reduce material costs.

 

DC sputtering is used for conductive targets, while RF sputtering is necessary for insulating targets (like many oxides) because it prevents charge buildup on the target’s surface.

 

In reactive sputtering, a reactive gas (e.g., oxygen or nitrogen) is introduced to form compound films on the substrate, but it may also “poison” the target surface if not carefully controlled.

 

Many manufacturers prefer to control raw material quality by sourcing their own powders; using external powders can risk impurities and inconsistent target properties.

 

Targets should be stored in clean, dry conditions (often in original packaging or re-wrapped in protective materials) and handled with gloves to avoid contamination, ensuring optimal performance during deposition.

Deposition rate depends on factors such as target material and composition, power density, working gas pressure, substrate distance, and the configuration of the sputtering system (e.g., magnetron design).

 
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