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Alloy Sputtering Targets

What Are Alloy Sputtering Targets?

Alloy sputtering targets are multi-element source materials supplied for sputter deposition. Start with the required nominal composition, then confirm target geometry, dimensions or drawing, cathode compatibility, backing-plate or bonding requirements, and quantity. Treat deposited-film composition as a result to verify under the intended process, not as an automatic copy of the target specification.

For selection or RFQ: send the composition, target type, finished dimensions or drawing, quantity, and any cathode, backing-plate, bonding, inspection, or documentation requirements. Browse the Sputtering Targets catalog or submit the available specification for review.

Explore Our Alloy Sputtering Target Selection

Alloy Sputtering Targets (Planar & Rotary Type)

Full Name Catalog Number Short Name Purity (%) Action
Aluminum Copper Alloy TFM-SPT-0006 Al-Cu 99.99/99.995
Aluminum Magnesium Alloy TFM-SPT-0011 Al-Mg 99.99
Aluminum Magnesium Silicon Alloy — Al-Mg-Si 99.99
Aluminum Neodymium Alloy TFM-SPT-0013 Al-Nd 99.99
Aluminum Scandium TFM-SPT-0017 Al-Sc 99.9
Aluminum Silicon Alloy TFM-SPT-0020 Al-Si 99.99
Aluminum Silicon Copper Alloy TFM-SPT-0019 Al-Si-Cu 99.99/99.995
Aluminum Titanium Alloy TFM-SPT-0023 Al-Ti 99.99
Chromium Silicon Alloy TFM-SPT-0526* Cr-Si 99.95
Cobalt Chromium Alloy TFM-SPT-0120* Co-Cr 99.95/99.99
Cobalt Iron Alloy TFM-SPT-0144 Co-Fe 99.95/99.99
Cobalt Iron Boron Alloy TFM-SPT-0142 Co-Fe-B 99.95
Cobalt Iron Copper Alloy — Co-Fe-Cu 99.95/99.99
Cobalt Nickel Alloy TFM-SPT-0148 Co-Ni 99.95/99.99
Copper Aluminum Alloy TFM-SPT-0165 Cu-Al 99.995/99.9995
Copper Cobalt Alloy TFM-SPT-0167 Cu-Co 99.95/99.99
Copper Gallium Alloy TFM-SPT-0169 Cu-Ga 99.99
Copper Indium Alloy TFM-SPT-0173 Cu-In 99.99
Copper Indium Gallium Alloy TFM-SPT-0171 Cu-In-Ga 99.99
Copper Manganese Alloy TFM-SPT-0388* Cu-Mn 99.95/99.99
Copper Nickel Alloy TFM-SPT-0175 Cu-Ni 99.95/99.99
Copper Silver  TFM-SPT-0177 Cu-Ag 84:16 wt% 99.9
Copper Zinc  TFM-SPT-0181 Cu-Zn 50-50 wt% 99.9
Copper Zirconium  TFM-SPT-0183 Cu-Zr 99.95
Gold Copper  TFM-SPT-0236 Au-Cu 99.9
Gold Palladium TFM-SPT-0238 Au-Pd 99.9
Gold Tin  TFM-SPT-0241 Au-Sn 99.9
Indium Antimony Alloy TFM-SPT-0258 In-Sb 99.99
Indium Tin Alloy TFM-SPT-0272 In-Sn 99.99
Iridium Manganese  TFM-SPT-0274 Ir-Mn 99.9
Iron Aluminum  TFM-SPT-0279 Fe-Al 99.9
Iron Cobalt Chromium Aluminum Alloy — Fe-Co-Cr-Al 99.9
Iron Cobalt Nickel Chromium Copper Alloy — Fe-Co-Ni-Cr-Cu 99.9
Iron Manganese Alloy TFM-SPT-0287 Fe-Mn 99.95
Nickel Aluminum Alloy TFM-SPT-0429 Ni-Al 99.995
Nickel Chromium Alloy TFM-SPT-0435 Ni-Cr 99.9
Nickel Chromium Aluminum Silicon  — Ni-Cr-Al-Si 99.9
Nickel Chromium Iron Alloy TFM-SPT-0255* Ni-Cr-Fe 99.9
Nickel Chromium Silicon Alloy TFM-SPT-0434 Ni-Cr-Si 99.995
Nickel Iron Alloy TFM-SPT-0440 / TFM-SPT-0441* Ni-Fe 99.995
Permalloy  TFM-SPT-0473 / TFM-SPT-0474* Ni-Fe-Mo-Mn 99.9
Nickel Molybdenum  TFM-SPT-0444 Ni-Mo 99.9
Nickel Titanium  TFM-SPT-0450 Ni-Ti 99.9
Nickel Manganese Alloy TFM-SPT-0443 Ni-Mn 99.95
Nickel Vanadium Alloy TFM-SPT-0452 Ni-V 99.995
Silicon Aluminum Alloy TFM-SPT-0020* Si-Al 99.99
Silver Copper Alloy TFM-SPT-0536 Ag-Cu 99.99
Silver Palladium  TFM-SPT-0537 Ag-Pd 99.9
Titanium Aluminum Alloy TFM-SPT-0608 Ti-Al 99.5
Titanium Aluminum Yttrium Alloy — Ti-Al-Y 99.5
Titanium Nickel Alloy TFM-SPT-0618 Ti-Ni 99.5
Titanium Silicon Alloy TFM-SPT-0626 Ti-Si 99.5
Titanium Zirconium Alloy TFM-SPT-0630 Ti-Zr 99.5
Tungsten Nickel Boride Alloy TFM-SPT-0639 WNiB 99.7
Tungsten Zirconium Boride Alloy TFM-SPT-0647 WZrB 99.7
Tungsten Silicon Alloy TFM-SPT-0643* W-Si 99.9
Tungsten Titanium Alloy TFM-SPT-0646 W-Ti 99.9
Zinc Aluminum Alloy TFM-SPT-0671 Zn-Al 99.99
Zinc Gallium Alloy — Zn-Ga 99.99
Zinc Tin  TFM-SPT-0692 Zn-Sn 52-48wt% 99.9
Zirconium Yttrium Alloy TFM-SPT-0707 / TFM-SPT-0708* Zr-Y 99.5

Common Types of Alloy Sputtering Targets and Their Key Properties

At Thin Film Materials (TFM), we provide a wide variety of alloy sputtering targets with different compositions, including:

Binary Alloy Targets (Two-Metal Combinations)

  • Titanium-Aluminum (TiAl) – Ideal for hard coatings and aerospace applications.
  • Copper-Nickel (CuNi) – Used in corrosion-resistant coatings and electronic components.
  • Molybdenum-Tungsten (MoW) – Provides excellent thermal and wear resistance.
  • Nickel-Iron (NiFe, Permalloy) – Key material in magnetic storage devices.

Ternary & Quaternary Alloy Targets (Three or More Elements)

  • Aluminum-Chromium-Titanium (AlCrTi) – High-performance coating for cutting tools.
  • Indium-Tin Oxide (ITO) – Transparent conductive coatings for displays and touchscreens.
  • Chromium-Silicon-Titanium (CrSiTi) – Advanced coatings for optical and wear-resistant applications.

Custom Alloy Targets

We also offer custom alloy compositions based on your specific requirements. Whether you need a unique combination for R&D or a specialized industrial application, TFM can produce alloy sputtering targets tailored to your needs.

Applications of Alloy Sputtering Targets

Alloy Sputtering Targets are widely used in high-tech industries, including:

1. Semiconductor Industry

  • Thin-film transistors (TFTs)
  • Microelectronic circuits
  • Integrated circuits (ICs)

2. Optics & Display Technologies

  • Anti-reflective (AR) coatings
  • Low-emissivity (Low-E) glass coatings
  • Optical mirrors and filters

3. Renewable Energy

  • Photovoltaic (PV) solar cells
  • Thin-film batteries
  • Fuel cell coatings

4. Aerospace & Automotive

  • Wear-resistant coatings for components
  • Thermal barrier coatings (TBCs)
  • Decorative and functional coatings

5. Hard Coatings & Tooling

  • Titanium-based alloys for cutting tools
  • Scratch-resistant coatings for consumer electronics
  • Wear-resistant coatings for industrial machinery

Technical Documents & SDS Downloads

Thin-Film Materials provides general Safety Data Sheets (SDS) for major ceramic sputtering target categories to support material handling, EHS compliance, and procurement documentation requirements.
These SDS files are intended as general reference documents for common ceramic material families and may not represent every specific composition, dopant level, impurity profile, or custom-engineered target. 
For product-specific SDS documentation, please refer to the individual product page or contact our sales team directly.

Alloy Sputtering Targets SDS (PDF)

Applicable to common alloy sputtering targets including:
NiCr, TiAl, CoCr, AlSi, CuInGa, NiFe, FeCo, TiW, MoNb, WTi, stainless steel alloys, high-entropy alloys, and related metallic alloy target materials.

Why Choose Thin Film Materials for Alloy Sputtering Targets?

When it comes to sputtering targets, quality and precision matter. At TFM, we provide:

✔ Industry-Leading Purity – High-quality materials to achieve superior thin-film performance.
✔ Custom Manufacturing – Tailored compositions to meet specific application needs.
✔ Competitive Pricing – Cost-effective solutions without compromising quality.
✔ Reliable Global Shipping – On-time delivery to support your production timelines.
✔ Expert Technical Support – Assistance in material selection and process optimization.

 

Are you looking for high-quality alloy sputtering targets for your thin-film deposition processes? Thin Film Materials is your trusted partner for standard and custom-engineered sputtering materials.

📩 Contact Us Today for pricing, technical support, or custom orders. Our team is ready to help you find the perfect sputtering target for your application!

📞 Get in Touch | 📧 sales@thinfilmmaterials.com | 🌐 www.thinfilmmaterials.com

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