ST0276 Chromium Sulfide Sputtering Target, Cr2S3

Chromium Sulfide Sputtering Target Description

A chromium sulfide sputtering target is a type of sulfide ceramic material composed of chromium and sulfur. This target is used in various thin film deposition processes, providing unique properties such as corrosion resistance and electrical conductivity. It is commonly utilized in applications like semiconductor manufacturing, display technologies, and photovoltaic devices. The material’s specific properties can be tailored to meet the requirements of different industries and applications.

Chromium is a chemical element whose name originates from the Greek word ‘chroma,’ meaning color, reflecting its colorful compounds. It was used as early as before 1 AD and was discovered by the Terracotta Army in ancient China. The canonical chemical symbol for chromium is “Cr,” and it holds the atomic number 24 in the periodic table. Chromium is positioned in Period 4 and Group 6, within the d-block, indicating it is a transition metal. The relative atomic mass of chromium is approximately 51.9961(6) Daltons, with the number in parentheses indicating the measurement uncertainty.

Related Product: Chromium Sputtering Target

Sulfur, also known as sulphur, is a chemical element whose name may derive from the Sanskrit word ‘sulvere’ or the Latin ‘sulfurium,’ both referring to sulfur. This element has been known and used since before 2000 BC, with its discovery attributed to ancient Chinese and Indian civilizations. The chemical symbol for sulfur is “S,” and it is found in the periodic table with an atomic number of 16. It is located in Period 3 and Group 16, placing it in the p-block. The relative atomic mass of sulfur is approximately 32.065(5) Daltons, with the number in parentheses indicating the uncertainty in this measurement.

Chromium Sulfide Sputtering Target Specification

Chromium Sulfide Sputtering Target Application

The chromium sulfide sputtering target is widely used in various applications, including thin film deposition, decoration, and in the manufacturing of semiconductor devices. It is also utilized in the production of displays, LED, and photovoltaic devices. This material is valued for its properties in functional coatings and is employed in industries related to optical information storage, glass coatings (such as those used in car and architectural glass), and optical communication technologies.

Chromium Sulfide Sputtering Target Packing

Our chromium sulfide sputtering targets are carefully tagged and labeled externally for easy identification and quality control. We take meticulous care in packaging and handling to prevent any potential damage during storage and transportation, ensuring that the products maintain their integrity and reach you in optimal condition.

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TFM offers Chromium Sulfide Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.