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Rotatory Titanium (Ti) Sputtering Target

ST0405 Rotatory Titanium (Ti) Sputtering Target

Chemical Formula: Ti
Catalog Number: ST0405
CAS Number: 7440-32-6
Purity: 99.9%-99.999%
Thermal Conductivity: 21.9 W/m.K
Melting Point (°C): 1,660
Coefficient of Thermal Expansion: 8.6 x 10-6/K

Rotatory Titanium sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Rotatory Titanium Sputtering Target Description

The Rotatory Titanium Sputtering Target is a series of processed products made from high-purity titanium material, designed to have specific sizes and shapes. These targets are primarily used for vacuum coating applications.

TitaniumTitanium is a chemical element with the symbol “Ti” and an atomic number of 22. The name “titanium” originates from the Titans, the sons of the Earth goddess in Greek mythology. It was first mentioned in 1791 and observed by William Gregor. The isolation of titanium was later accomplished and announced by Jöns Jakob Berzelius. Titanium is located in Period 4 and Group 4 of the periodic table, belonging to the d-block elements. Its relative atomic mass is approximately 47.867 Daltons, with the number in parentheses indicating a margin of uncertainty.

Related Product: Titanium (Ti) Sputtering Target

Rotatory Titanium Sputtering Target Specification

ODIDL
Dimension5.5”-7”5”-5.5”<138”

Material TypeTitanium
SymbolTi
Color/AppearanceSilvery Metallic
Melting Point1,660°C
Theoretical Density4.5(g/cc)

Rotatory Target VS. Planar Target

Compared to planar targets, rotary targets contain more material and offer greater utilization, resulting in longer production runs and reduced system downtime, which increases the throughput of the coating equipment. Additionally, rotary sputter targets allow for the use of higher power densities because the heat build-up is spread evenly over the surface area of the target. This leads to increased deposition speeds and improved performance during reactive sputtering.

Packaging

Our Rotatory Titanium Sputtering Targets are carefully handled to prevent damage during storage and transportation, ensuring the quality of our products is preserved in their original condition.

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TFM offers Rotatory Titanium (Ti) Sputtering Target  in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

It’s the source material (in solid form) used in sputter deposition to eject atoms or molecules that then form a thin film on a substrate.

Targets can be pure metals (e.g., gold, copper, aluminum), ceramics (e.g., Al₂O₃, SiO₂, TiO₂), alloys, or composites—chosen based on the film’s desired properties.

 

They are produced by processes such as melting/casting for metals or sintering (often with hot isostatic pressing) for ceramics and composite targets to ensure high density and purity.

 

In a vacuum chamber, a plasma (typically argon) bombards the target, ejecting atoms that travel and condense on a substrate, forming a thin film.

 

Key factors include the target’s purity, density, grain structure, and the sputtering yield (i.e. how many atoms are ejected per incident ion), as well as operating conditions like power density and gas pressure.

 

Operators monitor target erosion (often by measuring the depth of the eroded “race track”) or track total energy delivered (kilowatt-hours) until it reaches a threshold that can compromise film quality.

 

Fragile materials (such as many ceramics or certain oxides) and precious metals often require a backing plate to improve cooling, mechanical stability, and to allow thinner targets that reduce material costs.

 

DC sputtering is used for conductive targets, while RF sputtering is necessary for insulating targets (like many oxides) because it prevents charge buildup on the target’s surface.

 

In reactive sputtering, a reactive gas (e.g., oxygen or nitrogen) is introduced to form compound films on the substrate, but it may also “poison” the target surface if not carefully controlled.

 

Many manufacturers prefer to control raw material quality by sourcing their own powders; using external powders can risk impurities and inconsistent target properties.

 

Targets should be stored in clean, dry conditions (often in original packaging or re-wrapped in protective materials) and handled with gloves to avoid contamination, ensuring optimal performance during deposition.

Deposition rate depends on factors such as target material and composition, power density, working gas pressure, substrate distance, and the configuration of the sputtering system (e.g., magnetron design).

 
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