Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors

ST0517 Zirconium Oxide with Calcium Oxide Sputtering Target, ZrO2/CaO

Chemical Formula: ZrO2/CaO
Catalog Number: ST0517
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Zirconium Oxide with Calcium Oxide sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

Introduction

Zirconium Oxide stabilized with Calcium Oxide (ZrO₂/CaO) is a well-established ceramic system designed to enhance the structural and functional properties of zirconia. Calcium-stabilized zirconia (CSZ) exhibits improved phase stability, ionic conductivity, and mechanical strength compared to pure ZrO₂. As a sputtering target, ZrO₂/CaO is widely used for depositing robust, thermally stable thin films in applications ranging from energy systems to protective and functional coatings.

Detailed Description

ZrO₂/CaO Sputtering Targets are produced through advanced ceramic processing, including high-purity powder preparation, controlled doping with calcium oxide, and high-temperature sintering. The addition of CaO stabilizes the cubic or partially stabilized zirconia phase, preventing phase transformation and volume changes that can lead to cracking or degradation.

The CaO content—typically in the range of 3–8 mol%—plays a critical role in determining the material’s ionic conductivity and structural stability. This makes ZrO₂/CaO particularly suitable for applications such as solid oxide fuel cells (SOFCs) and oxygen sensors.

These targets are manufactured with high density (≥95% of theoretical density) and uniform microstructure, ensuring stable sputtering rates and consistent film composition. Due to the ceramic nature of the material, targets are often bonded to copper backing plates using indium or elastomer bonding to improve thermal conductivity and reduce mechanical stress during sputtering.

ZrO₂/CaO coatings exhibit excellent resistance to high temperatures, corrosion, and thermal shock. Additionally, their dielectric properties and oxygen ion conductivity make them suitable for both insulating and functional layers in advanced devices.

Applications

Zirconium Oxide with Calcium Oxide Sputtering Targets are widely used in:

  • Solid oxide fuel cells (SOFC) and energy conversion devices
  • Oxygen sensors and electrochemical devices
  • Thermal barrier coatings for high-temperature environments
  • Dielectric and insulating layers in electronics
  • Protective coatings with high corrosion and wear resistance
  • Optical coatings and advanced ceramic thin films

Technical Parameters

ParameterTypical Value / RangeImportance
CompositionZrO₂ / CaO (3–8 mol% CaO typical)Determines phase stability and conductivity
Purity99.5% – 99.99%Ensures film consistency
Density≥ 95% theoreticalReduces porosity and particle generation
Diameter50 – 200 mm (custom available)Compatible with sputtering systems
Thickness3 – 6 mmAffects target lifetime
BondingIndium / Elastomer / Cu backingEnhances heat dissipation
Crystal StructureStabilized cubic / partially stabilizedImproves mechanical and thermal stability

Comparison with Related Materials

MaterialKey AdvantageTypical Application
ZrO₂/CaO (CSZ)Good ionic conductivity, cost-effective stabilizationSOFC, sensors
YSZ (ZrO₂/Y₂O₃)Higher ionic conductivityAdvanced fuel cells
Pure ZrO₂High hardness but less stableStructural ceramics

FAQ

QuestionAnswer
Can ZrO₂/CaO sputtering targets be customized?Yes, CaO content, size, density, and bonding options can be tailored.
What sputtering method is suitable?RF magnetron sputtering is typically used for oxide ceramic targets.
Why add CaO to ZrO₂?It stabilizes the crystal structure and enhances ionic conductivity.
Are bonded targets necessary?Yes, bonding improves thermal stability and reduces cracking risk.
Which industries use ZrO₂/CaO targets most?Energy, electronics, aerospace, and advanced materials research.

Packaging

Our Zirconium Oxide with Calcium Oxide Sputtering Targets are meticulously tagged and labeled externally to ensure efficient identification and maintain high standards of quality control. We take great care to prevent any potential damage during storage and transportation, ensuring the targets arrive in perfect condition.

Conclusion

Zirconium Oxide with Calcium Oxide Sputtering Targets provide a reliable and cost-effective solution for depositing thermally stable and functional oxide thin films. With customizable compositions and consistent quality, ZrO₂/CaO targets are ideal for applications in energy systems, electronics, and high-temperature environments.

For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

Reviews

There are no reviews yet.

Be the first to review “ST0517 Zirconium Oxide with Calcium Oxide Sputtering Target, ZrO2/CaO”

Your email address will not be published. Required fields are marked *

FAQ

It’s the source material (in solid form) used in sputter deposition to eject atoms or molecules that then form a thin film on a substrate.

Targets can be pure metals (e.g., gold, copper, aluminum), ceramics (e.g., Al₂O₃, SiO₂, TiO₂), alloys, or composites—chosen based on the film’s desired properties.

 

They are produced by processes such as melting/casting for metals or sintering (often with hot isostatic pressing) for ceramics and composite targets to ensure high density and purity.

 

In a vacuum chamber, a plasma (typically argon) bombards the target, ejecting atoms that travel and condense on a substrate, forming a thin film.

 

Key factors include the target’s purity, density, grain structure, and the sputtering yield (i.e. how many atoms are ejected per incident ion), as well as operating conditions like power density and gas pressure.

 

Operators monitor target erosion (often by measuring the depth of the eroded “race track”) or track total energy delivered (kilowatt-hours) until it reaches a threshold that can compromise film quality.

 

Fragile materials (such as many ceramics or certain oxides) and precious metals often require a backing plate to improve cooling, mechanical stability, and to allow thinner targets that reduce material costs.

 

DC sputtering is used for conductive targets, while RF sputtering is necessary for insulating targets (like many oxides) because it prevents charge buildup on the target’s surface.

 

In reactive sputtering, a reactive gas (e.g., oxygen or nitrogen) is introduced to form compound films on the substrate, but it may also “poison” the target surface if not carefully controlled.

 

Many manufacturers prefer to control raw material quality by sourcing their own powders; using external powders can risk impurities and inconsistent target properties.

 

Targets should be stored in clean, dry conditions (often in original packaging or re-wrapped in protective materials) and handled with gloves to avoid contamination, ensuring optimal performance during deposition.

Deposition rate depends on factors such as target material and composition, power density, working gas pressure, substrate distance, and the configuration of the sputtering system (e.g., magnetron design).

 
Shopping Cart
Scroll to Top