Thin Film Materials Logo
Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors
Lanthanum Nickel Oxide Evaporation Materials

VD0700 Lanthanum Nickel Oxide Evaporation Materials, LaNiO3

Catalog No.VD0700
MaterialLanthanum Nickel Oxide (LaNiO3)
Purity99.9%
ShapePowder/ Granule/ Custom-made

TFM stands out as a premier producer and distributor of high-purity lanthanum nickel oxide evaporation materials, along with a broad range of other evaporation materials. Our offerings come in both powder and granule forms, and we also provide customized options to meet specific needs upon request.

 

MSDS File
Lanthanum Nickel Oxide Evaporation Materials Description

TFM provides top-quality lanthanum nickel oxide evaporation materials, featuring the chemical formula LaMnO3. These high-purity LaMnO3 materials are essential for achieving superior film quality in deposition processes. Our lanthanum nickel oxide evaporation materials are produced with a remarkable purity level of up to 99.9995%, ensuring reliability and excellence in performance through rigorous quality assurance measures.

Related Products: Lanthanum Evaporation Materials, Manganese Evaporation Materials

Lanthanum Nickel Oxide Evaporation Materials Applications

Our lanthanum nickel oxide evaporation materials are versatile and used in various applications, including:

  • Deposition Processes: Ideal for semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optics: Suitable for wear protection, decorative coatings, and display technologies.

Lanthanum Nickel Oxide Evaporation Materials Packaging

To ensure the highest standards of quality and identification, our lanthanum nickel oxide evaporation materials are meticulously tagged and labeled. We take all necessary precautions to prevent damage during storage and transportation.

Contact Us

TFM is a leading source for high-purity lanthanum nickel oxide evaporation materials, available in various forms such as tablets, granules, rods, and wires. Customized forms and quantities can be arranged upon request. Additionally, we offer evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For current pricing and to inquire about other materials, please contact us.

Reviews

There are no reviews yet.

Be the first to review “VD0700 Lanthanum Nickel Oxide Evaporation Materials, LaNiO3”

Your email address will not be published. Required fields are marked *

Related Products

Related products

FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

Shopping Cart
Scroll to Top