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Yttrium(III) Fluoride Evaporation Materials

VD0796 Yttrium(III) Fluoride Evaporation Materials, YF3

Catalog No.VD0796
MaterialYttrium Fluoride (YF3)
Purity99.9%
ShapePowder/ Granule/ Custom-made

TFM stands out as a premier manufacturer and supplier specializing in high-purity yttrium(III) fluoride evaporation materials. Our extensive range includes both powder and granule forms of evaporation materials. For specific needs, we also provide customized forms tailored to your requirements.

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Yttrium(III) Fluoride Evaporation Materials Description

TFM offers high-purity yttrium(III) fluoride (YF3) evaporation materials, known for their quality and performance in various deposition processes. Yttrium fluoride, with its white appearance, has a melting point of 1,387°C and a density of 4.01 g/cm³. This fluoride ceramic is commonly utilized in glasses and ceramics, and serves as a non-radioactive alternative to thorium fluoride (ThF4) for certain applications. Our high-purity YF3 materials, boasting up to 99.9995% purity, are essential for achieving superior film quality in deposition processes. Our stringent quality assurance procedures ensure that every product meets the highest standards of reliability.

Yttrium(III) Fluoride Evaporation Materials Specification

Material TypeYttrium(III) Fluoride
SymbolYF3
Appearance/ColorWhite solid
Melting Point1,387 °C (2,529 °F; 1,660 K)
Density4.01 g/cm3
Purity99.9%
ShapePowder/ Granule/ Custom-made

Yttrium(III) Fluoride Evaporation Materials Applications

Our yttrium(III) fluoride evaporation materials are integral to a range of deposition techniques, including semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD). They are primarily used for optics, wear protection, decorative coatings, and display technologies.

Yttrium(III) Fluoride Evaporation Materials Packaging

To ensure quality and prevent damage, our yttrium(III) fluoride evaporation materials are meticulously tagged and labeled for efficient identification. We prioritize careful packaging to protect the materials during storage and transportation.

Contact Us

TFM is a top-tier manufacturer and supplier of high-purity yttrium(III) fluoride evaporation materials, available in various shapes such as tablets, granules, rods, and wires. We also offer customized forms and quantities upon request. In addition to evaporation materials, we provide evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For inquiries about current prices or to request materials not listed, please contact us.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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