Thin Film Materials Logo
Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors
Lanthanum Hexaboride Evaporation Materials

VD0834 Lanthanum Hexaboride Evaporation Materials, LaB6

Catalog No.VD0834
MaterialLanthanum Boride (LaB6)
Purity99.9%
ShapePowder/ Granule/ Custom-made

TFM is a premier manufacturer and supplier of high-purity lanthanum hexaboride (LaB₆) evaporation materials, along with a diverse range of other evaporation materials. We provide these materials in both powder and granule forms, with customized options available to meet specific requirements.

MSDS File
Lanthanum Hexaboride Evaporation Materials Overview

Lanthanum hexaboride (LaB6) is a highly specialized boride ceramic used in evaporation processes for thin film deposition. Known for its exceptional purity and performance, this material is essential in ensuring the quality of deposited films. At TFM, we produce lanthanum hexaboride with a remarkable purity level of up to 99.9995%, employing rigorous quality control measures to ensure each batch meets our high standards.

Specifications

Material TypeLanthanum Hexaboride
SymbolLaB6
Appearance/ColorIntense purple violet
Melting Point2,210 °C (4,010 °F; 2,480 K)
Density4.72 g/cm3
Purity99.9%
ShapePowder/ Granule/ Custom-made

Applications

Lanthanum hexaboride is primarily used in advanced deposition techniques such as semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD). It plays a critical role in applications involving optics, including protective coatings, decorative finishes, and display technologies.

Packaging and Handling

Our lanthanum hexaboride products are meticulously packaged with clear labeling to ensure easy identification and stringent quality control. We take extensive measures to prevent damage during storage and transport, maintaining the integrity of the material until it reaches your facility.

Contact Us

As a premier manufacturer of high-purity lanthanum hexaboride, TFM offers a variety of product forms including tablets, granules, rods, and wires, with custom options available upon request. We also supply related components such as evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For current pricing and more information on our full range of products, please reach out to us with your inquiry.

Reviews

There are no reviews yet.

Be the first to review “VD0834 Lanthanum Hexaboride Evaporation Materials, LaB6”

Your email address will not be published. Required fields are marked *

Related Products

Related products

FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

Shopping Cart
Scroll to Top