Tantalum Powders
MetalsTek stands at the forefront as a leading supplier of premium Tantalum Powders tailored for metallurgical applications. These powders boast finely tuned grain sizes and an exceptionally high purity. Demonstrating technical functionality and cost-effectiveness, these powders consistently meet ‘ expectationsour customers’ expectations. Above all, MetalsTek ensures the availability of top-notch tantalum products marked by unwavering quality.
Tantalum Powder Metallurgical Grade

Purity: Ta 99.9%, 99.99%, 99.999%
Melting Point: 3,017 °C
Typical Density: 16.6 g/cm3
CAS #: 7440-25-7
Specifications (Impurities, PPM≤)
Grade | O | H | N | C | Fe | Ni | Cr | Si | Ti | Nb | W | Mo | Mn |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
TA031 | 1500 | 30 | 50 | 50 | 10 | 5 | 5 | 10 | 5 | 10 | 5 | 5 | 5 |
TA032 | 1800 | 30 | 150 | 80 | 50 | 50 | 30 | 50 | 10 | 50 | 30 | 20 | 10 |
TA033 | 2000 | 50 | 150 | 150 | 50 | 50 | 50 | 100 | 10 | 50 | 30 | 20 | 10 |
TA034 | 3000 | 100 | 450 | 200 | 200 | 200 | 200 | 300 | 100 | 300 | 100 | 100 | 10 |
Physical Properties
Bulk Density (g/cm3) | 5.0-7.5 | 4.5-7.0 | 3.5 -7.0 | 3.5-7.0 |
Average Particle Size (μm) | 6.0-13.0 | 6.0-12.0 | 5.0-12.0 | 5.0-12.0 |
Tantalum Powder Spherical, Nano Size & Micro Size

Purity: Ta 99.9% Min.
Morphology: Spherical
Particle Size: 50nm, 100nm, 1~10μm, 5~25μm, 15~45μm, Can be Customized
Application: Cold Spraying, Plasma Spraying, Target Alloy Additives, Surgical Metal Implants, Orthopedic Prostheses, Shielding Parts
Spherical Tantalum Powder Specifications
Ta (%) | Ti (%) | W (%) | Mo (%) | Cr (%) | Fe (%) | O (%) |
---|---|---|---|---|---|---|
>99.9 | <0.001 | <0.001 | <0.001 | <0.0001 | <0.01 | <0.8 |
Powder Morphology | Particle Size Distribution (nm) | Specific Surface Area (m2/g) | ||||
D10 | D50 | D90 | ||||
Spherical | 0-30 | 50-60 | <300 | ≥10.0 |
Ta-100nm
Ta (%) | Ti (%) | W (%) | Mo (%) | Cr (%) | Fe (%) | O (%) |
---|---|---|---|---|---|---|
>99.9 | <0.001 | <0.001 | <0.001 | <0.0001 | <0.01 | <0.5 |
Powder Morphology | Particle Size Distribution (nm) | Specific Surface Area (m2/g) | ||||
D10 | D50 | D90 | ||||
Spherical | 30-60 | 80-100 | <1000 | ≥8.0 |
Ta (%) | Ti (%) | W (%) | Mo (%) | Cr (%) | Fe (%) | O (%) |
---|---|---|---|---|---|---|
>99.9 | <0.001 | <0.001 | <0.001 | <0.0001 | <0.01 | <0.08 |
Sphericity (%) | Particle Size Distribution (nm) | Tap Density (g/cm3) | ||||
D10 | D50 | D90 | ||||
>94 | >1 | 5±2 | <10 | ≥10.5 |
Ta 5~25μm
Ta (%) | Ti (%) | W (%) | Mo (%) | Cr (%) | Fe (%) | O (%) |
---|---|---|---|---|---|---|
>99.9 | <0.001 | <0.001 | <0.001 | <0.0001 | <0.01 | <0.02 |
Sphericity (%) | Particle Size Distribution (nm) | Bulk Density (g/cm3) | Tap Density (g/cm3) | Fluidity (s/50g) | ||
D10 | D50 | D90 | ||||
>94 | ≥5 | 15±3 | ≤25 | ≥10.0 | ≥10.5 | ≤8.0 |
Ta 15~45μm
Ta (%) | Ti (%) | W (%) | Mo (%) | Cr (%) | Fe (%) | O (%) |
---|---|---|---|---|---|---|
>99.9 | <0.001 | <0.001 | <0.001 | <0.0001 | <0.01 | <0.01 |
Sphericity (%) | Particle Size Distribution (nm) | Bulk Density (g/cm3) | Tap Density (g/cm3) | Fluidity (s/50g) | ||
D10 | D50 | D90 | ||||
>94 | >15 | 30±3 | <45 | ≥9.5 | ≥10.0 | ≤6.0 |
Tantalum Powder Capacitor Grade (4V~40V)

Purity: Ta 99.9%, 99.99%, 99.999%
Melting Point: 3,017 °C
Typical Density: 16.6 g/cm3
CAS #: 7440-25-7
- Used to manufacture high performance chip or dipping type tantalum electrolyte capacitors.
- Used to produce small lightweight anodes with capacitance control.
- Used in medical technology.
Specifications
Grade | Chemical Compositions | Physical Properties | Electrical Properties | |||
---|---|---|---|---|---|---|
Impurities ppm≤ | SBD | Fsss | Capacitance | Dc Leakage | ||
O | N | (g/cc) | (μm) | (μFV/g) | (μA/μFV) | |
TaA01 | 1800 | 100 | 1.9-2.5 | 4.5-7.5 | 6000+10 -5% | <2.0×10-4 |
TaA02 | 2200 | 120 | 1.8-2.3 | 4.5-6.5 | 8000+10 -5% | <2.0×10-4 |
TaA03 | 2400 | 150 | 1.7-2.1 | 2.5-4.5 | 15000+10 -5% | <2.2×10-4 |
TaA04 | 1800 | 150 | 1.6-2.0 | 2.4-3.5 | 23000+10 -5% | <2.2×10-4 |
TaA05 | 2300 | 400 | 1.7-2.1 | 2.4-3.5 | 32000+10 -5% | <2.5×10-4 |
TaA06 | 2500 | 400 | 1.6-2.0 | 2.0-3.5 | 40000+10 -5% | <2.5×10-4 |
TaA07 | 3200 | 400 | 1.6-2.0 | 2.0-3.4 | 50000+10 -5% | <2.5×10-4 |
TaA08 | 3600 | 600 | 1.5-1.9 | 1.8-3.0 | 70000+10 -5% | <2.8×10-4 |
TaA09 | 5000 | 1500 | 1.5-1.9 | 1.4-2.8 | 80000+10 -5% | <3.1×10-4 |
TaA10 | 6000 | 1500 | 1.4-2.3 | 1.2-2.6 | 100000+5 -5% | <3.5×10-4 |
TaA11 | 7500 | 1800 | 1.7-1.9 | 0.8-2.2 | 120000+5 -5% | <3.5×10-4 |
TaA12 | 8500 | 2500 | 1.4-2.0 | 1.1-2.3 | 150000+5 -5% | <3.5×10-4 |
TaA13 | 9500 | 2700 | 1.68-1.98 | 1.6-2.8 | 170000+5 -5% | <4.0×10-4 |
TaA14 | 11500 | 3000 | 1.6-2.1 | 1.0-2.6 | 200000+5 -5% | <4.5×10-4 |
Tantalum Powder Capacitor Grade (20V~60V)

Purity: Ta 99.9%, 99.99%, 99.999%
Melting Point: 3,017 °C
Typical Density: 16.6 g/cm3
CAS #: 7440-25-7
Chemical and Physical Properties
Grade | Bulk Density | Average Particle Size | Impurities ppm≤ | |
---|---|---|---|---|
g/cm3 | μm | O | N | |
TaB01 | 1.8-3.5 | 5.0-9.5 | 1600 | 60 |
TaB02 | 1.5-3.0 | 3.5-6.0 | 2200 | 150 |
TaB03 | 1.5-2.5 | 3.0-6.0 | 2000 | 150 |
TaB04 | 1.5-2.5 | 3.0-5.5 | 2200 | 150 |
TaB05 | 1.3-2.0 | 2.0-4.5 | 2200 | 200 |
TaB06 | 1.5-2.0 | 2.0-4.0 | 2500 | 300 |
TaB07 | 1.5-2.0 | 2.0-4.0 | 2500 | 300 |
TaB08 | 1.3-2.0 | 1.5-3.5 | 2800 | 400 |
Electrical Properties
Grade | Inspection Condition | Standard Condition | |||||
---|---|---|---|---|---|---|---|
Briquetting Weight | Briquetting Density | Sintering Condition | Energized Voltage/Test Voltage | Capacitance | Dc Leakage | ||
(g) | (g/cm3) | (℃/min) | (V) | (μFV)/g | μA/(μFV) ≤ | ||
TaB01 | 2 | 6.5 | 1850/30 | 240/170 | 5000 | 6×10-4 | |
TaB02 | 1 | 5.5 | 1750/30 | 200/140 | 800 | 4.5×10-4 | |
TaB03 | 0.2 | 5.5 | 1750/30 | 200/140 | 8000 | 4×10-4 | |
TaB04 | 1 | 5.5 | 1700/30 | 160/112 | 10000 | 4×10-4 | |
TaB05 | 0.5 | 5 | 1600/30 | 160/112 | 15000 | 5.5×10-4 | |
TaB06 | 0.15 | 5 | 1500/30 | 140/98 | 20000 | 5×10-4 | |
TaB07 | 0.15 | 5 | 1450/30 | 100/70 | 30000 | 5×10-4 | |
TaB08 | 0.15 | 5 | 1400/30 | 70/49 | 40000 | 40000 | 5×10-4 |
Tantalum Powder Capacitor Grade (Above 60V)

Purity: Ta 99.9%, 99.99%, 99.999%
Melting Point: 3,017 °C
Typical Density: 16.6 g/cm3
CAS #: 7440-25-7
Applications
- Used to produce small lightweight anodes with capacitance control.
- Used in medical technology.
- Used to manufacture solid tantalum electrolytic capacitors (above 60V) due to its high purity, good sinter ability and high breakdown voltage.
Chemical and Physical Properties
Grade | Bulk Density | Average Particle Size | Impurities ppm≤ | |
---|---|---|---|---|
g/cm3 | μm | O | N | |
TaC01 | 5.0-7.5 | 11.0-17.0 | 1000 | 40 |
TaC02 | 4.5-6.5 | 10.0-16.0 | 1100 | 40 |
TaC03 | 4.5-6.5 | 9.0-15.0 | 1100 | 40 |
TaC04 | 4.5-6.0 | 8.0-14.0 | 1200 | 40 |
TaC05 | 3.0-5.5 | 8.0-13.0 | 1300 | 40 |
TaC06 | 3.0-4.5 | 7.0-12.0 | 1400 | 50 |
TaC07 | 2.5-4.5 | 5.0-7.5 | 2500 | 100 |
Electrical Properties
Grade | Inspection Condition | Standard Condition | ||||
---|---|---|---|---|---|---|
Briquetting Weight | Briquetting Density | Sintering Condition | Energized Voltage/Test Voltage | Capacitance | Dc. Leakage | |
(g) | (g/cm3) | (℃/min) | (V) | (μFV)/g | μA/(μFV) | |
TaC01 | 2 | 9.5 | 2050/30 | 270/240 | 1000 | 6×10-4 |
TaC02 | 2 | 8.5 | 2050/30 | 270/240 | 1500 | 6×10-4 |
TaC03 | 2 | 8.5 | 2050/30 | 270/240 | 200 | 6×10-4 |
TaC04 | 2 | 7.5 | 2050/30 | 270/240 | 2500 | 7×10-4 |
TaC05 | 2 | 7.5 | 2050/30 | 270/240 | 2800 | 7×10-4 |
TaC06 | 2 | 6.5 | 1950/30 | 270/240 | 3500 | 7×10-4 |
TaC07 | 2 | 6.5 | 2050/30 | 270/240 | 4000 | 7×10-4 |
Description
Tantalum Powder possesses exceptional characteristics, including high density and remarkable thermal and electrical conductivity. Recognized for having the fourth-highest melting point among all metals, Tantalum Powder finds significant utility in optics and electronics applications. Its outstanding fatigue resistance makes it more durable than glass and graphic systems. Tantalum is also a perfect material for capacitors. MetalsTek Engineering supplies Tantalum powder in Nano Size, Micro Size, Metallurgical Grade, and Capacitor Grade (from 4V to over 60V). The production of Tantalum Powder involves generating high-purity, minimally sized grains, making it a key component for manufacturing Tantalum Sputtering Targets.
Given these distinctive properties, Tantalum Metal Powder is an ideal choice for various applications in the optics and electronics sectors.

Packaging of Tantalum Powder
The Tantalum Powder offered by MetalsTek Engineering undergoes meticulous handling to minimize potential damage during storage and transportation, ensuring the products maintain their original quality.