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Sputtering Target
Pure Metal Targets
Alloy Sputtering Targets
Ceramic Sputtering Targets
Rare Earth Sputtering Targets
Rotary Sputtering Targets
Evaporation Materials
Pure Metal Evaporation Material
Oxide Evaporation Material
Compound Evaporation Material
Alloy Evaporation Material
Evaporation Source
Crucibles
Boat Sources
Micro-Electronics Evaporation Sources
Thermal Filament Sources
Thermal Rod Sources
Basket Heaters
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Powder
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Thin Film Substrates
High-temperature Superconducting Thin Film Substrates
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Titanium Oxide (TiOx) Rotary Sputtering Target
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Titanium Powder
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Titanium Zirconium Vanadium Sputtering Target, TiZrV
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Tungsten Aluminum Boride Sputtering Target, WAlB₂
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608.00
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Tungsten Carbide (WC) Evaporation Materials
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Tungsten Hafnium Carbide Sputtering Target, WHfC
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Tungsten Powder
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800.00
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Ultra High Vacuum (UHV) Aluminum Foil
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V41 Series: Remote Plasma Control Valves
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V42 Series: Heated Angle Valve with Temperature Controller
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V44 Series Soft Start Valves
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V70S Series Rectangular Gate Valves (Low Profile)
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