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Sputtering Target
Pure Metal Targets
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Ceramic Sputtering Targets
Rare Earth Sputtering Targets
Rotary Sputtering Targets
Evaporation Materials
Pure Metal Evaporation Material
Oxide Evaporation Material
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ST0431 Bismuth Manganate Sputtering Target, Bi2.4MnO3
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554.00
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ST0431A Bismuth Manganate Sputtering Target, BiMnO3
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554.00
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ST0431B Bismuth Manganate Sputtering Target, Bi3MnO3
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ST0432 Cerium Bismuth Ferrite Sputtering Target, Ce2.2Bi0.8Fe5O12
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ST0433 Cerium Yttrium Ferrite Sputtering Target, Ce2.5Y0.5Fe5O12
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ST0434 Cobalt Ferrite Sputtering Target, CoFe2O4
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ST0435 Europium Nickel Oxide Sputtering Target, EuNiO3
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455.00
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ST0436 Europium(II) Titanate Sputtering Target, EuTiO3
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ST0437 Gadolinium Cerium Oxide Sputtering Target, Gd0.2Ce0.8O2
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ST0438 Indium Aluminum Zinc Oxide Sputtering Target, In2O3/Al2O3/ZnO, 65/16/19 wt%
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ST0439 Indium Iron Oxide Sputtering Target, InFe2O4
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ST0440 Indium Molybdenum Oxide Sputtering Target, In2O3/Mo, 98/2 wt%
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