Weldable Tube Conical Reducers

We produce weldable conical reducer tube fittings from 304 series stainless steel, making them perfect for roughing lines in semiconductor process equipment and for foreline and pump exhaust lines in semiconductor subfabs.

Features of Weldable Conical Reducers:

  • Optimized Design: Adapts to smaller diameter tubes while minimizing conductance loss.
  • High Cleanliness: Ensures maximum cleanliness for UHV applications, reaching levels greater than 10<sup>-13</sup> Torr.
  • Wide Temperature Range: Suitable for temperatures ranging from -200 to 450 °C.
  • Custom Options: Common wall thicknesses and tube diameters are available; please contact us for specific requirements or flanged versions.

Specifications

Vacuum Range≥ 1×10-13 Torr.
Temperature Range-200° to 450° C

Ordering Table

Drawing WallThickness DimA TubeOD TubeOD 2 Note Part Number
Tooltip 0.07 1.38 1 0.75 B-31W100-075
Tooltip 0.07 2.38 1.5 0.75 B-31W150-075
Tooltip 0.07 2.38 1.5 1 B-31W150-100
Tooltip 0.07 2.38 2 1 B-31W200-100
Tooltip 0.07 2.38 2 1.5 B-31W200-150
Tooltip 0.07 2.38 2.5 1.5 B-31W250-150
Tooltip 0.07 2.38 2.5 2 B-31W250-200
Tooltip 0.07 3.62 3 1.5 B-31W300-150
Tooltip 0.07 3.62 3 2 B-31W300-200
Tooltip 0.07 3.62 3 2.5 B-31W300-250
Tooltip 0.07 3.62 4 1.5 B-31W400-150
Tooltip 0.07 3.62 4 2 B-31W400-200
Tooltip 0.07 3.62 4 2.5 B-31W400-250
Tooltip 0.07 3.62 4 3 B-31W400-300
Tooltip 0.07 5.5 6 3 B-31W600-300
Tooltip 0.07 5.5 6 4 B-31W600-400

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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