Perfluoroelastomer (FFKM) Kalrez® O-Rings (0.210 Section): Precision Sealing for Harsh Semiconductor and Plasma Environments
Perfluoroelastomer (FFKM) Kalrez® O-Rings (0.210 section) from TFM are specifically designed for demanding semiconductor, plasma, and chemical processing systems. Manufactured using Kalrez® 4079, a high-performance FFKM compound, these O-rings provide superior chemical resistance, mechanical durability, and thermal stability in environments that involve reactive plasma, aggressive chemicals, and high heat.
With a 0.210-inch cross-section, this size is ideal for medium-scale sealing applications in CVD/PVD equipment, gas delivery systems, and etch chambers where reliability and purity are essential. Kalrez® 4079 performs reliably in continuous service at up to 316°C, and is capable of withstanding higher temperatures briefly.
Product Specifications:
Material Grade: Kalrez® 4079 (Perfluoroelastomer, FFKM)
Color: Black
Durometer: 75 Shore A
Cross-Section Diameter: 0.210 inches
Temperature Range: –19°C to +316°C (continuous), short-term excursions allowed
Key Features:
Exceptional Chemical Resistance to acids, solvents, and reactive gases
Low Weight Loss in Plasma, reducing contamination in clean environments
Excellent Compression Set Resistance for reliable long-term sealing
Thermal Endurance for high-heat, high-vacuum, and cycling environments
UHV & Semiconductor Grade Performance
Not Recommended For:
Hot water or steam exposure
Hot aliphatic amines
Ethylene oxide or propylene oxide
Common Applications:
Semiconductor process tools (etch, deposition, diffusion)
Gas delivery manifolds and high-purity valves
Analytical instrumentation under corrosive or high-temperature conditions
Vacuum system interfaces in plasma-enhanced processes
TFM’s Kalrez® FFKM O-Rings (0.210 section) ensure uncompromising performance where ultra-high purity, temperature resilience, and chemical compatibility are critical to uptime and yield.
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