Introduction
Manganese Bismuth (MnBi) Sputtering Targets are alloy deposition materials used in magnetic, spintronic, and functional thin film research where controlled magnetic anisotropy and temperature-dependent behavior are required. MnBi is especially attractive for rare-earth-free magnetic materials research, offering unique ferromagnetic properties and strong perpendicular magnetic anisotropy in thin film form.
Detailed Description
MnBi sputtering targets are produced by precisely alloying high-purity manganese and bismuth under controlled conditions to achieve uniform composition and stable phase distribution. Because Mn and Bi differ significantly in melting point and vapor pressure, careful control of alloying, casting, and consolidation is essential to minimize segregation and ensure compositional consistency across the target.
Targets are available as unbonded discs for low-to-moderate power operation, or bonded to copper backing plates to improve heat dissipation and mechanical stability during higher-power magnetron sputtering. Tight control of thickness, flatness, and surface finish helps reduce arcing, particle generation, and compositional drift during deposition.
MnBi targets are commonly used with DC magnetron sputtering for conductive compositions, and can also be adapted for RF sputtering depending on system design and process requirements.
Applications
Rare-earth-free magnetic thin films
Spintronic and magneto-optical research
Permanent magnet material studies
Functional alloy and intermetallic coatings
Advanced materials science and R&D
Technical Parameters
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Material | Manganese Bismuth (MnBi) | Magnetic intermetallic alloy |
| Composition | Stoichiometric or custom Mn/Bi ratio | Tunes magnetic properties |
| Purity | 99.9% – 99.99% (total) | Impacts film performance |
| Form | Disc / Plate (bonded or unbonded) | System compatibility |
| Diameter | 25 – 300 mm (custom) | Fits standard magnetron cathodes |
| Thickness | 3 – 6 mm (typical) | Influences target lifetime |
| Backing Plate | Copper (optional) | Improves thermal management |
Comparison with Related Materials
| Material | Key Advantage | Typical Application |
|---|---|---|
| Manganese Bismuth (MnBi) | Rare-earth-free magnetism | Spintronics & magnetic films |
| Cobalt (Co) | Strong ferromagnetism | Magnetic multilayers |
| Iron Platinum (FePt) | High anisotropy | Data storage research |
FAQ
| Question | Answer |
|---|---|
| Can the Mn/Bi ratio be customized? | Yes, compositions can be tailored to specific magnetic requirements. |
| Are bonded targets recommended? | Yes, copper-backed targets are preferred for higher power sputtering. |
| Is DC sputtering suitable for MnBi? | Yes, DC magnetron sputtering is commonly used. |
| How is alloy uniformity ensured? | Through controlled alloying, casting, and precision machining. |
| Is a Certificate of Analysis provided? | Yes, CoA is available upon request. |
Packaging
Our Manganese Bismuth Sputtering Targets are cleaned for vacuum service, individually labeled, and vacuum-sealed to prevent oxidation and contamination. Shock-absorbing materials and export-grade cartons or wooden crates are used to ensure safe transportation and storage.
Conclusion
Manganese Bismuth Sputtering Targets deliver reliable alloy uniformity, stable sputtering performance, and flexible composition control for advanced magnetic thin film deposition. With customizable specifications and consistent quality control, they are well suited for cutting-edge magnetic materials research and functional coating applications.
For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.
Reviews
There are no reviews yet.