Thin Film Materials Logo
Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors
Chromium Cobalt Sputtering Target

ST0071 Chromium Cobalt Sputtering Target, Cr/Co

Chemical Formula: Cr/Co
Catalog Number: ST0071
CAS Number: 7440-47-3 | 7440
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Chromium Cobalt sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

Chromium Cobalt Sputtering Target Description

The chromium-cobalt sputtering target from TFM is a silvery alloy composed of chromium (Cr) and cobalt (Co). This high-quality sputtering material is suitable for various applications requiring these specific elements.

Chromium

Chromium, symbolized as “Cr,” is a chemical element named after the Greek word ‘chroma,’ meaning color. This element, which has been known and used since before 1 AD, was associated with the Terracotta Army. Chromium holds the atomic number 24 in the periodic table and is located in Period 4 and Group 6 within the d-block. Its relative atomic mass is 51.9961(6) Daltons, with the number in brackets representing the measurement uncertainty.

Related Product: Chromium Sputtering Target

Cobalt

Cobalt, symbolized as “Co,” is a chemical element named after the German word ‘kobald,’ meaning goblin. It was first identified in 1732 by G. Brandt. Cobalt has an atomic number of 27 and is situated in Period 4 and Group 9 of the d-block in the periodic table. Its relative atomic mass is 58.933195(5) Daltons, with the number in brackets indicating the uncertainty in measurement.

Related Product: Cobalt Sputtering Target

Chromium Cobalt Sputtering Target Specification

Material TypeChromium Cobalt
SymbolCr/Co
Color/AppearanceSilvery, Metallic Target
Melting Point1330 °C
Density10 g/cm3
Available SizesDia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Chromium Cobalt Sputtering Target Packing

Our chromium-cobalt sputter targets are carefully tagged and labeled for efficient identification and stringent quality control. We take extensive measures to prevent any damage during storage and transportation, ensuring that our products remain in excellent condition.

Get Contact

TFM offers Chromium Cobalt Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

Reviews

There are no reviews yet.

Be the first to review “ST0071 Chromium Cobalt Sputtering Target, Cr/Co”

Your email address will not be published. Required fields are marked *

Related Products

Related products

FAQ

It’s the source material (in solid form) used in sputter deposition to eject atoms or molecules that then form a thin film on a substrate.

Targets can be pure metals (e.g., gold, copper, aluminum), ceramics (e.g., Al₂O₃, SiO₂, TiO₂), alloys, or composites—chosen based on the film’s desired properties.

 

They are produced by processes such as melting/casting for metals or sintering (often with hot isostatic pressing) for ceramics and composite targets to ensure high density and purity.

 

In a vacuum chamber, a plasma (typically argon) bombards the target, ejecting atoms that travel and condense on a substrate, forming a thin film.

 

Key factors include the target’s purity, density, grain structure, and the sputtering yield (i.e. how many atoms are ejected per incident ion), as well as operating conditions like power density and gas pressure.

 

Operators monitor target erosion (often by measuring the depth of the eroded “race track”) or track total energy delivered (kilowatt-hours) until it reaches a threshold that can compromise film quality.

 

Fragile materials (such as many ceramics or certain oxides) and precious metals often require a backing plate to improve cooling, mechanical stability, and to allow thinner targets that reduce material costs.

 

DC sputtering is used for conductive targets, while RF sputtering is necessary for insulating targets (like many oxides) because it prevents charge buildup on the target’s surface.

 

In reactive sputtering, a reactive gas (e.g., oxygen or nitrogen) is introduced to form compound films on the substrate, but it may also “poison” the target surface if not carefully controlled.

 

Many manufacturers prefer to control raw material quality by sourcing their own powders; using external powders can risk impurities and inconsistent target properties.

 

Targets should be stored in clean, dry conditions (often in original packaging or re-wrapped in protective materials) and handled with gloves to avoid contamination, ensuring optimal performance during deposition.

Deposition rate depends on factors such as target material and composition, power density, working gas pressure, substrate distance, and the configuration of the sputtering system (e.g., magnetron design).

 
Shopping Cart
Scroll to Top