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Vanadium Oxide Sputtering Target, V2O5

Vanadium Oxide Sputtering Target, V2O5

Material: Vanadium Pentoxide Sputtering Target
Formula: V2O5
Catalog No.: TFM-SPT-0655

V2O5 oxide sputtering source. State target phase and geometry, power and atmosphere context, and film oxygen/phase verification needs. Grade, dimensions, assembly, documentation and availability are confirmed in the quotation.

What is a vanadium pentoxide sputtering target?

A vanadium pentoxide (V2O5) sputtering target is an oxide source for vanadium-oxide thin-film research. Oxygen content and vanadium-oxide phase in the final film depend on the process, so a V2O5 target label cannot by itself guarantee film stoichiometry.

Material and Deposition Characteristics

RF magnetron sputtering is commonly considered for insulating or semiconducting oxide targets, while sufficiently conductive formulations may allow alternative power modes in some systems. Target density and microstructural uniformity matter because pores, cracks, and local inhomogeneities can contribute to unstable plasma, particles, or target damage. For brittle ceramics, bonded assemblies and gradual power ramping are often worth evaluating.

How to specify vanadium pentoxide sputtering target for an RFQ

The following fields define the order and the tests needed to qualify this target; final availability and acceptance criteria belong in the approved quotation or drawing.

DecisionInformation to provide or verify
Material identitySpecify the required target formula or phase, purity and density evidence, and acceptance limits for relevant impurities.
Target and cathode fitProvide target geometry, backing or support needs, cooling context, and planned RF or other qualified power mode.
Film acceptanceDefine film V:O ratio, phase, thickness, and process-atmosphere measurements needed for the intended vanadium-oxide layer.

Send the specification and drawing for review. The selected source or target and the deposited film require separate acceptance evidence.

Browse the Sputtering Targets catalog for the broader material and source family.

Research applications and film checks

  • RF-sputtered vanadium-pentoxide films have been studied for electrochromic and electrochemical layers; oxygen content and substrate temperature affect film structure and response (research example).
  • For an electrochromic project, define the required optical response, cycling test and film phase; for an electrochemical project, define the relevant composition and charge-storage measurements. These are research contexts, not guaranteed film outcomes.
  • State the target phase, power/atmosphere plan and post-treatment context, then verify the deposited film V:O ratio and phase under the selected recipe.

Target Configuration and Ordering Considerations

When requesting a quotation, provide target diameter or rectangular dimensions, thickness, purity or composition, required quantity, and whether a backing plate or bonded assembly is needed. For brittle ceramic or compound targets, it is useful to specify the cathode model, backing-plate material, preferred bonding method, operating power if known, and any density, tolerance, or inspection-document requirements. TFM can review drawings, old-target photos, and application details when custom dimensions are required.

Frequently Asked Questions

Is Vanadium Oxide better suited to RF or DC sputtering?

RF magnetron sputtering is commonly considered for insulating or semiconducting oxide targets. If a specific formulation is sufficiently conductive, other modes may also be possible, but the equipment and target properties should be confirmed.

Why is density important for a Vanadium Oxide target?

Density and microstructural uniformity affect erosion stability, thermal behavior, and particle risk. Pores, cracks, or local density variations can contribute to unstable sputtering and target damage.

Should a Vanadium Oxide target be bonded to a backing plate?

Bonding is often useful for brittle oxide targets because it can improve mechanical support and heat transfer. The backing material and bonding method should be chosen according to target size, thickness, and operating conditions.

Will the deposited film always have the same composition as V2O5?

Not always. Film composition can be affected by preferential sputtering, reactive gas, substrate temperature, re-sputtering, and chamber conditions. Composition-sensitive films should be verified after deposition.

How should power be ramped on a brittle Vanadium Oxide target?

A conservative power ramp and stable cooling are generally advisable. The exact operating procedure should follow the target size, bonding condition, cathode design, and supplier recommendations rather than a universal wattage.

What information should I provide when ordering Vanadium Oxide?

Provide formula or composition, purity, dimensions, quantity, backing and bonding requirements, cathode model or drawing, and any density, tolerance, or inspection requirements.

Prepare your RFQ: Download the fillable Vanadium Oxide Sputtering Target, V2O5 RFQ Worksheet (PDF). Enter the required composition or grade, dimensions, backing or bonding request, quantity, documents, and acceptance criteria for quotation review.

Order Now

V₂O₅ target 4N ø50.8×3.18mm, V2O5 TRG Ø101×6×3.2 mm, Cu BP, V2O5 TRG Ø102×3.2 mm, Cu BP, V2O5 TRG Ø120×6 mm, Cu BP

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FAQ

It’s the source material (in solid form) used in sputter deposition to eject atoms or molecules that then form a thin film on a substrate.

Targets can be pure metals (e.g., gold, copper, aluminum), ceramics (e.g., Al₂O₃, SiO₂, TiO₂), alloys, or composites—chosen based on the film’s desired properties.

 

Manufacturing routes depend on the material and target specification. Metal targets may be cast and machined, while some ceramic targets are consolidated by sintering. Ask for the product-specific route and inspection criteria when these affect qualification.

 

In a vacuum chamber, a plasma (typically argon) bombards the target, ejecting atoms that travel and condense on a substrate, forming a thin film.

 

Key factors include the target’s purity, density, grain structure, and the sputtering yield (i.e. how many atoms are ejected per incident ion), as well as operating conditions like power density and gas pressure.

 

Operators monitor target erosion (often by measuring the depth of the eroded “race track”) or track total energy delivered (kilowatt-hours) until it reaches a threshold that can compromise film quality.

 

Bonding may be selected for brittle targets, thinner precious-metal targets, or a cathode that needs a specific backing and cooling arrangement. It is not a universal requirement. Provide target and backing dimensions, the cathode model, and operating conditions for assembly review.

 

DC is commonly used with conductive targets. RF is often used for poorly conducting or insulating targets to mitigate surface charging; other power modes may be suitable depending on the target, cathode, and process. Confirm the mode against the equipment and material.

 

In reactive sputtering, a reactive gas (e.g., oxygen or nitrogen) is introduced to form compound films on the substrate, but it may also “poison” the target surface if not carefully controlled.

 

Customer-supplied powder acceptance is not assumed. Provide material identity, lot traceability, composition and impurity analysis, quantity, and handling constraints in the RFQ. TFM must confirm feasibility and acceptance criteria before any material is sent.

 

Targets should be stored in clean, dry conditions (often in original packaging or re-wrapped in protective materials) and handled with gloves to avoid contamination, ensuring optimal performance during deposition.

Deposition rate depends on factors such as target material and composition, power density, working gas pressure, substrate distance, and the configuration of the sputtering system (e.g., magnetron design).

 
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