Thin Film Materials Logo
Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors
Europium(II) Titanate Sputtering Target

ST0436 Europium(II) Titanate Sputtering Target, EuTiO3

Chemical Formula: EuTiO3
Catalog Number: ST0436
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

 Europium Titanate sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Europium Titanate Sputtering Target Description

Europium titanate sputtering target is composed of rare earth europium, titanium, and oxide with the chemical formula of EuTiO3 or ETO. High-purity europium titanate sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. TFM specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Related products: Europium Sputtering Target, Titanium Sputtering Target

EuropiumTitaniumOxygen

Europium Titanate Sputtering Target Specification

Material TypeEuropium Titanate
SymbolEuTiO3 or ETO
Color/AppearanceBlack Solid
CAS Number12020-61-0
StructurePerovskite
Type of BondElastomer, Indium
Available SizesDia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets; please Contact Us for more information.

Europium(II) Titanate Sputtering Target Application

The europium titanate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating, as well as other optical information storage space industry, glass coating industry such as car glass and architectural glass, optical communication, etc.

Europium(II) Titanate Sputtering Target Packaging

Our europium titanate sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

TFM offers Europium Titanate Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

Reviews

There are no reviews yet.

Be the first to review “ST0436 Europium(II) Titanate Sputtering Target, EuTiO3”

Your email address will not be published. Required fields are marked *

Related Products

Related products

FAQ

It’s the source material (in solid form) used in sputter deposition to eject atoms or molecules that then form a thin film on a substrate.

Targets can be pure metals (e.g., gold, copper, aluminum), ceramics (e.g., Al₂O₃, SiO₂, TiO₂), alloys, or composites—chosen based on the film’s desired properties.

 

They are produced by processes such as melting/casting for metals or sintering (often with hot isostatic pressing) for ceramics and composite targets to ensure high density and purity.

 

In a vacuum chamber, a plasma (typically argon) bombards the target, ejecting atoms that travel and condense on a substrate, forming a thin film.

 

Key factors include the target’s purity, density, grain structure, and the sputtering yield (i.e. how many atoms are ejected per incident ion), as well as operating conditions like power density and gas pressure.

 

Operators monitor target erosion (often by measuring the depth of the eroded “race track”) or track total energy delivered (kilowatt-hours) until it reaches a threshold that can compromise film quality.

 

Fragile materials (such as many ceramics or certain oxides) and precious metals often require a backing plate to improve cooling, mechanical stability, and to allow thinner targets that reduce material costs.

 

DC sputtering is used for conductive targets, while RF sputtering is necessary for insulating targets (like many oxides) because it prevents charge buildup on the target’s surface.

 

In reactive sputtering, a reactive gas (e.g., oxygen or nitrogen) is introduced to form compound films on the substrate, but it may also “poison” the target surface if not carefully controlled.

 

Many manufacturers prefer to control raw material quality by sourcing their own powders; using external powders can risk impurities and inconsistent target properties.

 

Targets should be stored in clean, dry conditions (often in original packaging or re-wrapped in protective materials) and handled with gloves to avoid contamination, ensuring optimal performance during deposition.

Deposition rate depends on factors such as target material and composition, power density, working gas pressure, substrate distance, and the configuration of the sputtering system (e.g., magnetron design).

 
Shopping Cart
Scroll to Top