ST0970 Germanium Disulphide Sputtering Target, GeS2

Chemical FormulaGeS2
Catalog No.ST0970
CAS Number12025-34-2
Purity99.9%, 99.95%, 99.99%, 99.995%, 99.999%
ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

Germanium Disulphide sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

Germanium Disulphide Sputtering Target Description

TFM offers Germanium Disulphide Sputtering Targets, crafted from premium-grade materials to ensure superior performance and reliability in thin-film deposition. Our targets feature a unique Germanium and Disulphide composition, providing high electrical conductivity, a high melting point, and excellent chemical stability. These attributes make them ideal for applications in microelectronics, solar cells, and other advanced thin-film processes. TFM’s Germanium Disulphide Sputtering Targets meet the stringent requirements of both research and manufacturing professionals, supporting precise material control and high-quality results.

Related Product: Germanium Sputtering Target, Germanium Sulfide Sputtering Target

Germanium Disulphide Sputtering Target Specifications

Compound FormulaGeS2
Molecular Weight136.77
AppearanceWhite Target
Melting Point800 °C
Density2.94 g/cm3
Available SizesDia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Germanium Disulphide Sputtering Target Handling Notes

Indium bonding is recommended for Germanium Disulphide Sputtering Targets due to the material’s brittleness and low thermal conductivity, which can pose challenges during sputtering. The use of indium bonding helps mitigate these issues, enhancing sputtering performance and extending the target’s lifespan. This material’s low thermal conductivity and susceptibility to thermal shock necessitate careful handling to maintain its integrity and performance.

Germanium Disulphide Sputtering Target Application

  • Microelectronics: Used in sputter coating for fabricating electronic devices and integrated circuits. The high thermal and electrical conductivity of the target material ensures performance and reliability in microelectronics.
  • Solar Cells: Applied in the preparation of thin film solar cells, where precise control of film thickness and composition enhances photovoltaic conversion efficiency.
  • Sensors and Detectors: Utilized to create photoelectric sensors and detectors due to their high photoconductive properties, enabling the detection of light, radiation, and other signals.
  • Optical Devices: Employed in the manufacture of optical films such as transmittance enhancement films, reflective films, and filters, which improve the performance of optical devices.
  • Composites and Ceramics: Integrated with other materials to produce composites and ceramics, achieving specific physical and chemical properties tailored for various applications.

Germanium Disulphide Sputtering Target Packaging

Our Germanium Disulphide Sputtering Target is meticulously handled throughout storage and transportation to ensure it arrives in pristine condition, maintaining the highest quality standards.

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TFM offers Germanium Disulphide Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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