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VD0592 Zirconium Evaporation Materials, Zr

Material Type:Zirconium
Symbol:Zr
Color/Appearance:Silvery White, Metallic
Purity:99% ~ 99.5%
Shape:Powder/ Granule/ Custom-made

TFM is a top manufacturer and supplier of high-purity Zirconium Evaporation Materials, along with a broad range of other evaporation materials. We provide these materials in both powder and granule forms, with options for custom specifications available to meet your unique needs.

Introduction

Zirconium Evaporation Materials (Zr) are widely used in physical vapor deposition (PVD) processes where high film purity, strong adhesion, and excellent corrosion resistance are required. As a reactive transition metal with strong oxygen and nitrogen affinity, zirconium plays a key role in optical coatings, protective layers, and functional thin films across semiconductor, optics, and energy-related industries.

Detailed Description

Zirconium evaporation materials are produced from high-purity zirconium metal through vacuum melting and precision machining to ensure controlled composition and minimal impurity levels. They are commonly supplied in forms such as pellets, granules, pieces, slugs, wire, or custom-cut shapes to suit different evaporation sources, including resistance boats, crucibles, and electron-beam (e-beam) systems.

One of zirconium’s most valuable characteristics is its strong chemical reactivity with residual gases such as oxygen and nitrogen. During evaporation, this property enables the formation of dense, adherent metallic zirconium films or zirconium-based compound films when used in reactive evaporation environments. Zirconium coatings exhibit excellent corrosion resistance, thermal stability, and mechanical robustness, making them suitable for demanding service conditions.

Compared with many other refractory metals, zirconium offers a balanced combination of moderate melting point, good evaporation behavior, and compatibility with standard PVD equipment. Strict control of surface cleanliness and purity is essential, as trace impurities can significantly affect film optical and electrical performance. For this reason, zirconium evaporation materials are carefully cleaned and packaged to preserve their high-purity state.

Applications

Zirconium Evaporation Materials are commonly used in:

  • Optical coatings and interference filters

  • Decorative and protective thin films

  • Corrosion-resistant coatings

  • Semiconductor device fabrication

  • Getter and oxygen-scavenging layers

  • Energy-related coatings and R&D applications

Technical Parameters

ParameterTypical Value / RangeImportance
MaterialZirconium (Zr)Base metal for zirconium thin films
Purity99.9% – 99.99%Minimizes contamination and defects
FormPellets, pieces, granules, wireCompatible with various evaporation sources
Melting Point~1855 °CInfluences evaporation method selection
Evaporation MethodThermal / E-beamFlexible PVD process compatibility
Oxygen ContentControlled (low ppm)Critical for film quality and consistency

Comparison with Related Evaporation Materials

MaterialKey AdvantageTypical Application
Zirconium (Zr)Strong adhesion, corrosion resistanceOptical & protective coatings
Titanium (Ti)Excellent adhesionGeneral-purpose PVD films
Hafnium (Hf)Higher temperature stabilityHigh-end optical coatings

FAQ

QuestionAnswer
What evaporation methods are suitable for zirconium?Both thermal evaporation and electron-beam evaporation are commonly used.
Can zirconium be used for reactive evaporation?Yes, it is frequently used with oxygen or nitrogen to form compound films.
Are custom forms available?Yes, size, shape, and form can be customized.
How should zirconium materials be stored?In vacuum-sealed or inert packaging to prevent oxidation.
Is zirconium suitable for optical applications?Yes, zirconium films and compounds are widely used in optical coatings.

Packaging

Our Zirconium Evaporation Materials are meticulously cleaned and vacuum-sealed to minimize oxidation and contamination. Each batch is clearly labeled and securely packed with protective materials to ensure safe storage and transportation while preserving material integrity.

Conclusion

Zirconium Evaporation Materials (Zr) provide a reliable and versatile solution for high-performance thin film deposition. With high purity, multiple form options, and excellent film properties, zirconium is an ideal choice for optical, semiconductor, and advanced coating applications.

For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

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Zirconium (Zr) Pieces ~3 mm 3N per kg

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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