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Chromium(III) Oxide Evaporation Materials

VD0680 Chromium(III) Oxide Evaporation Materials, Cr2O3

Material Type: Chromium Oxide
Symbol: Cr2O3
Color/Appearance: Green, Crystalline Solid
Purity: 99.5% ~ 99.99%
Shape: Powder/ Granule/ Custom-made

Thin-Film Mat Engineering (TFM) excels as a top manufacturer and supplier of high-purity chromium(III) oxide evaporation materials, along with a broad range of other evaporation materials. We provide these materials in both powder and granule forms, with options for custom shapes available upon request.
MSDS File

Chromium(III) Oxide Evaporation Materials (Cr₂O₃)

Introduction

Chromium(III) Oxide (Cr₂O₃) Evaporation Material is a high-performance ceramic source used for thermal and electron-beam (e-beam) evaporation processes. Known for its deep green color and exceptional chemical stability, Cr₂O₃ is widely utilized to deposit hard, corrosion-resistant, and decorative thin films. Its excellent optical properties also make it valuable in optical coatings and energy-related applications.

Detailed Description

Chromium(III) oxide is a chemically stable and refractory compound with a melting point around 2435 °C, allowing it to perform reliably under high-vacuum and high-temperature deposition conditions. During evaporation, Cr₂O₃ forms dense, adherent thin films that exhibit excellent hardness, wear resistance, and chemical inertness.

These evaporation materials are typically fabricated into pellets, granules, or pieces for use in resistance-heated boats, crucibles, or e-beam sources. Each batch is carefully processed to achieve consistent purity and particle size, ensuring repeatable evaporation rates and film quality.

Key Features:

  • High melting point for stable evaporation behavior.

  • Strong adhesion and hardness of deposited films.

  • Chemically inert and corrosion-resistant.

  • Uniform coating performance and low contamination risk.

  • Available in multiple forms and purities.

Applications

Chromium(III) oxide evaporation materials are widely used in:

  • Optical coatings – antireflective and infrared-absorbing films.

  • Decorative coatings – for jewelry, watches, and architectural glass.

  • Hard protective layers – for cutting tools and wear components.

  • Semiconductor processes – diffusion barriers and dielectric layers.

  • Energy devices – coatings in photovoltaic and fuel cell components.

Technical Parameters

ParameterTypical Value / RangeImportance
Chemical FormulaCr₂O₃Defines film composition
Purity99.9% – 99.99%Reduces contamination and defects
Melting Point2435 °CEnables stable high-temp operation
Density5.21 g/cm³Ensures consistent evaporation rate
Evaporation SourceBoat / Crucible / E-beamFits multiple deposition systems
FormPellets / Granules / PiecesCustomizable for system requirements

Comparison with Related Materials

MaterialKey AdvantageTypical Application
Chromium(III) Oxide (Cr₂O₃)Hardness & corrosion resistanceOptical & decorative coatings
Chromium (Cr)High reflectivity & conductivityMetallic coatings
Titanium Oxide (TiO₂)High refractive indexOptical filters
Aluminum Oxide (Al₂O₃)Thermal stability & transparencyProtective coatings

FAQ

QuestionAnswer
Can Cr₂O₃ be used in both resistance and e-beam systems?Yes, it is compatible with both methods.
What crucible materials are recommended?Tungsten, molybdenum, or alumina crucibles.
What color are Cr₂O₃ coatings?Typically dark green to grayish-green, depending on thickness.
How is it packaged?Vacuum-sealed with moisture protection and cushioned for transport.
What industries use it most?Optics, semiconductors, decorative coatings, and tooling.

Packaging

Each Chromium(III) Oxide Evaporation Material is vacuum-sealed to prevent contamination and moisture absorption. The materials are cushioned with foam and packed in anti-static or aluminum-laminated bags inside export-safe cartons or wooden crates.

Conclusion

Chromium(III) Oxide (Cr₂O₃) evaporation materials provide outstanding hardness, chemical resistance, and optical stability, making them indispensable for advanced thin film deposition. Their reliability and versatility make them a top choice for both industrial and research applications.

For detailed specifications and quotations, please contact us at [sales@thinfilmmaterials.com].

Ordering Table

Material Size Quantity Purity Part Number
Chromium Oxide 2 mm - 6 mm Pieces 1 lb. 99.9% EVMCROX3-6MM
Chromium Oxide 2 mm - 6 mm Pieces 25 G 99.9% EVMCROX3-6MMA
Chromium Oxide 2 mm - 6 mm Pieces 50 G 99.9% EVMCROX3-6MMB
Chromium Oxide 2 mm - 6 mm Pieces 100 G 99.9% EVMCROX3-6MMD
Chromium Oxide 2 mm - 6 mm Pieces 250 G 99.9% EVMCROX3-6MMJ
Chromium Oxide 2 mm - 6 mm Pieces 1 kg 99.9% EVMCROX3-6MMKG
Chromium Oxide 2 mm - 6 mm Pieces 500 G 99.9% EVMCROX3-6MMT

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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