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Chromium(III) Oxide Evaporation Materials

Chromium(III) Oxide Evaporation Materials, Cr2O3

Material: Chromium Oxide
Chemical Formula: Cr2O3
Catalog No.: TFM-EVM-0077
Purity: 99.5% ~ 99.99%
Color/Appearance: Green, Crystalline Solid
Shape: Powder/ Granule/ Custom-made

Chromium Oxide evaporation material is supplied by Thin Film Materials (TFM) for vacuum evaporation and thin-film deposition. Available form, size, purity, and packaging can be customized to suit research and production requirements.

MSDS File

Product Overview

Chromium Oxide Evaporation Materials (Cr2O3) is a ceramic evaporation material for depositing oxide thin films used in optical, dielectric, electronic, magnetic, protective, or research applications. Many oxides have high melting temperatures and can partially dissociate or lose oxygen during evaporation, making electron-beam evaporation a common process option. Source density, pellet or piece geometry, crucible compatibility, oxygen background, deposition rate, and substrate conditions can all affect film stoichiometry and microstructure.

Evaporation Behavior and Process Considerations

Electron-beam evaporation is frequently evaluated for ceramic oxides because many have high melting temperatures. During heating, oxygen can be lost or the source can partially dissociate, so oxygen partial pressure, substrate temperature, deposition rate, and any post-deposition anneal may need optimization. The source should be conditioned gradually to minimize cracking, spitting, and sudden outgassing.

Technical Data

ParameterTypical Value / RangeImportance
Chemical FormulaCr₂O₃Defines film composition
Purity99.9% – 99.99%Reduces contamination and defects
Melting Point2435 °CEnables stable high-temp operation
Density5.21 g/cm³Ensures consistent evaporation rate
Evaporation SourceBoat / Crucible / E-beamFits multiple deposition systems
FormPellets / Granules / PiecesCustomizable for system requirements
MaterialKey AdvantageTypical Application
Chromium(III) Oxide (Cr₂O₃)Hardness & corrosion resistanceOptical & decorative coatings
Chromium (Cr)High reflectivity & conductivityMetallic coatings
Titanium Oxide (TiO₂)High refractive indexOptical filters
Aluminum Oxide (Al₂O₃)Thermal stability & transparencyProtective coatings
QuestionAnswer
Can Cr₂O₃ be used in both resistance and e-beam systems?Yes, it is compatible with both methods.
What crucible materials are recommended?Tungsten, molybdenum, or alumina crucibles.
What color are Cr₂O₃ coatings?Typically dark green to grayish-green, depending on thickness.
How is it packaged?Vacuum-sealed with moisture protection and cushioned for transport.
What industries use it most?Optics, semiconductors, decorative coatings, and tooling.

Typical Thin-Film Applications

  • Optical, dielectric, transparent conductive, magnetic, protective, or functional oxide films
  • Displays, photovoltaics, sensors, semiconductors, and multilayer optical coatings where applicable
  • Research on composition, oxygen content, phase, and post-deposition treatment

Source Form and Ordering Considerations

For quotation, provide the material or formula, purity, desired source form and size, quantity, evaporation method if known, and any crucible, boat, or e-beam hearth constraints. For compound materials, include the target film composition or application when possible so that source form and process risk can be reviewed together. TFM can supply pellets, pieces, granules, tablets, or other custom forms subject to material manufacturability.

Frequently Asked Questions

Is Chromium Oxide commonly evaporated by electron beam?

Electron-beam evaporation is frequently evaluated for high-melting ceramic oxides because it can provide localized heating. The exact method depends on the oxide, source form, and required film properties.

Can Chromium Oxide lose oxygen during evaporation?

Yes. Some oxides can partially dissociate or become oxygen-deficient under vacuum heating. Oxygen partial pressure, substrate temperature, deposition rate, and post-annealing can influence the final film composition.

Why can oxide evaporation sources spit or crack?

Rapid heating, trapped gas, porosity, and thermal gradients can cause cracking or particle ejection. A gradual conditioning ramp and stable source geometry help reduce these effects.

Does the deposited film always match the composition of Cr2O3?

Not always. Preferential evaporation, oxygen loss, decomposition, and substrate conditions can shift film chemistry or phase relative to the source material.

What source form is suitable for Chromium Oxide?

Pellets, tablets, pieces, or granules may be used depending on the e-beam pocket or crucible. A dense and mechanically stable source form is usually easier to condition reproducibly.

What information should I provide for a Chromium Oxide quotation?

Provide formula or composition, purity, source form and size, quantity, evaporation method, source-holder dimensions, and any film-composition or documentation requirements.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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