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Magnesium Fluoride Evaporation Materials

VD0785 Magnesium Fluoride Evaporation Materials, MgF2

Catalog No.VD0785
MaterialMagnesium Fluoride
Purity99.9%
ShapePowder/ Granule/ Custom-made

TFM is a trusted leader in the production and supply of high-purity magnesium fluoride evaporation materials. Alongside magnesium fluoride, we offer a broad selection of other high-quality evaporation materials to meet various industry demands. Available in both powder and granule forms, our products provide versatility for different applications. Additionally, we offer customized formulations to suit your specific project needs.

MSDS_MgF2Pdf

MSDS File

Introduction

Magnesium Fluoride Evaporation Materials (MgF₂) are industry-standard sources for producing low refractive index optical thin films. Known for their exceptional transparency from the ultraviolet (UV) to the infrared (IR) region, MgF₂ films are widely used in anti-reflection (AR) coatings, precision optics, and multilayer interference systems.

In physical vapor deposition (PVD) processes such as thermal evaporation and electron beam evaporation, MgF₂ is valued for its stable evaporation behavior and optical performance. High-purity MgF₂ evaporation materials ensure consistent film density, low absorption loss, and excellent environmental durability.

Detailed Description

Magnesium Fluoride (MgF₂) is a crystalline fluoride compound with a melting point of approximately 1263°C and excellent optical transparency across a broad spectral range (UV to IR). Its low refractive index (~1.38 at 550 nm) makes it one of the most important materials for anti-reflection coatings.

Key features include:

  • High Optical Purity (typically 3N–5N) – Minimizes scattering and absorption in optical films.

  • Stable Stoichiometric Composition – Ensures predictable refractive index and film performance.

  • Low Moisture Sensitivity Compared to Other Fluorides – Improves handling stability under controlled conditions.

  • Optimized Particle or Pellet Form – Promotes uniform melting and reduces spitting during evaporation.

MgF₂ evaporation materials are supplied in powder, granule, or pellet form compatible with tungsten boats, molybdenum crucibles, or graphite liners. Electron beam evaporation is commonly preferred for higher film density and better optical performance, though thermal evaporation is also widely used.

Process parameters such as substrate temperature and deposition rate can significantly influence film packing density and optical properties, especially in high-performance AR coatings.

Applications

Magnesium Fluoride Evaporation Materials are extensively used in:

  • Anti-Reflection (AR) Coatings
    Single-layer or multilayer AR films for lenses, displays, and optical windows.

  • UV Optical Systems
    Coatings for UV-grade optics and lithography components.

  • Laser Optics
    Protective and performance-enhancing layers in laser systems.

  • Infrared (IR) Optical Components
    Transparent coatings in IR imaging and sensing equipment.

  • Precision Multilayer Interference Filters
    Low-index layers combined with high-index materials for spectral control.

Technical Parameters

ParameterTypical Value / RangeImportance
Purity99.9% – 99.999% (3N–5N)Reduces optical loss and contamination
Chemical FormulaMgF₂Ensures stable refractive index
Refractive Index~1.38 (550 nm, thin film)Ideal for AR applications
Melting Point~1263°CSuitable for thermal & e-beam evaporation
FormPowder / Granules / PelletsCompatible with deposition systems
PackagingVacuum-sealed / moisture-protectedMaintains chemical stability

Comparison with Related Fluoride Materials

MaterialKey AdvantageTypical Application
Magnesium Fluoride (MgF₂)Very low refractive index & wide transparencyAnti-reflection coatings
Lanthanum Fluoride (LaF₃)Higher refractive index fluorideMultilayer optical stacks
Yttrium Fluoride (YF₃)Good durability & optical clarityLaser coatings
Aluminum Fluoride (AlF₃)UV transparencySpecialized UV optics

Compared to other fluoride materials, MgF₂ remains the preferred low-index material in optical coating design due to its balanced optical performance, stability, and processing reliability.

FAQ

QuestionAnswer
Is MgF₂ suitable for both thermal and e-beam evaporation?Yes, it is compatible with both methods, though e-beam often provides higher density films.
What purity grade is recommended for optical coatings?4N or higher is typically preferred for precision optical applications.
Does MgF₂ absorb moisture?It is relatively stable but should still be stored in dry, sealed packaging.
Can pellet size be customized?Yes, granule and pellet dimensions can be tailored to specific source designs.
Which industries use MgF₂ films most?Optics manufacturing, laser systems, display technology, and research institutions.

Packaging

Our Magnesium Fluoride Evaporation Materials are meticulously tagged and labeled externally to ensure efficient identification and maintain high standards of quality control. We take great care to prevent any potential damage during storage and transportation, ensuring the materials arrive in perfect condition.

Conclusion

Magnesium Fluoride Evaporation Materials (MgF₂) provide a reliable and high-purity solution for producing low-index, optically transparent thin films. With stable composition, flexible supply formats, and compatibility with common evaporation techniques, MgF₂ remains a foundational material in advanced optical coating systems.

For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

Ordering Table

Material Size Quantity Purity Part Number
Magnesium Fluoride 1mm - 2.5mm Pieces 1 kg 99.99% EVMMGF-1-2.5
Magnesium Fluoride 1mm - 2.5mm Pieces 25 g 99.99% EVMMGF-1-2.5A
Magnesium Fluoride 1mm - 2.5mm Pieces 50 g 99.99% EVMMGF-1-2.5B
Magnesium Fluoride 1mm - 2.5mm Pieces 500 g 99.99% EVMMGF-1-2.5T
Magnesium Fluoride 1mm - 4mm Pieces 500 g 99.995-99.999% EVMMGF501-4T
Magnesium Fluoride 3mm - 6mm Pieces 50 g 99.9% EVMMGF-1113B
Magnesium Fluoride 3mm - 6mm Pieces 100 g 99.9% EVMMGF-1113D
Magnesium Fluoride 3mm - 6mm Pieces 500 g 99.9% EVMMGF-1113T
Magnesium Fluoride 3mm - 6mm Pieces 1 kg 99.9% EVMMGF1113KG

 

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MgF₂ Granules 3N, 1–3 mm, 1 kg, MgF₂ Granules 3N, 1–3 mm, 1 kg

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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