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VD0540 Calcium (Ca) Evaporation Materials

Material Type：Calcium
Symbol：Ca
Color/Appearance：Silvery White, Metallic
Purity： 99% ~ 99.5%
Shape： Powder/ Granule/ Custom-made

TFM supplies Barium Evaporation Materials and is a leading manufacturer and supplier of high-purity Barium Evaporating Materials, along with a wide variety of other evaporation materials. We offer our materials in powder, granule, and customized forms upon request.

MSDS File

Calcium Evaporation Materials Description

High-purity calcium evaporation materials are crucial for obtaining high-quality films in various deposition processes. TFM specializes in manufacturing calcium evaporating materials with purity levels reaching up to 99.5%. Our rigorous quality assurance protocols ensure the reliability and performance of these materials.

Calcium, with a density of 1.54 g/cm³ and a melting point of 839°C, also has a vapor pressure of 10⁻⁴ Torr at 459°C. Beyond its industrial applications, calcium is a vital element for human life, predominantly found in bones and teeth.

calcium evaporation materials

Calcium Evaporation Materials Specification

Atomic Weight 40.078
Atomic Number 20
Color/Appearance Silvery White, Metallic
Thermal Conductivity 200 W/m.K
Melting Point (°C) 839
Coefficient of Thermal Expansion 22.3 x 10-6/K
Theoretical Density (g/cc) 1.54
Z Ratio 2.62
Max Power Density*(Watts/Square Inch) 20
UN Number 1401

Calcium Evaporation Materials Applications

Calcium evaporation materials are widely used in various deposition processes, including semiconductor deposition, Chemical Vapor Deposition (CVD), and Physical Vapor Deposition (PVD). In the optics field, they are applied in wear protection, decorative coatings, and display technologies. Their high purity and performance are essential for achieving precise and effective results in these advanced applications.

Calcium Evaporation Materials Packaging

We take great care in handling our calcium evaporation pellets to prevent any damage during storage and transportation. This meticulous process ensures that the pellets retain their original quality and integrity, providing reliable performance upon arrival.

Ordering Table 

Material Size Quantity Purity Part Number
Calcium Approximately 3mm 25 g 99% EVMCAX203MMA
Calcium Approximately 3mm 50 g 99% EVMCAX203MMB
Calcium Approximately 3mm 100 g 99% EVMCAX203MMD

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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