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Zinc Fluoride Evaporation Materials

VD0797 Zinc Fluoride Evaporation Materials, ZnF2

Catalog No.VD0797
MaterialZinc Fluoride (ZnF2)
Purity99.9% ~ 99.99%
ShapePowder/ Granule/ Custom-made

TFM stands at the forefront of producing and supplying top-tier, high-purity zinc fluoride evaporation materials. We specialize in a diverse range of evaporation materials, available in both powder and granule forms. For those with specific needs, we also offer customized material options to meet individual requirements.

MSDS File

Zinc Fluoride Evaporation Materials

Introduction

Zinc Fluoride (ZnF₂) Evaporation Materials are widely used in thin film deposition for optical and electronic applications. With its excellent transparency in the deep ultraviolet (DUV) to infrared range and strong resistance to moisture, zinc fluoride is an important material for producing anti-reflective coatings, beam splitters, and protective layers in advanced optical systems.

Detailed Description

Zinc Fluoride evaporation materials are typically supplied in the form of granules, pellets, or pieces with high purity levels (99.9%–99.99%). These materials are compatible with both thermal evaporation and electron beam (e-beam) evaporation systems.

Key features include:

  • High Optical Transparency: Transmits over a broad spectral range (0.2–7 µm).

  • Low Refractive Index (~1.37): Ideal for anti-reflective coatings.

  • Good Moisture Resistance: More durable compared to other fluorides like MgF₂.

  • High Purity: Ensures thin films with excellent uniformity and minimal contamination.

  • Thermal Stability: Stable under vacuum evaporation conditions.

Applications

Zinc Fluoride evaporation materials are used in:

  • Optical Coatings: Anti-reflective layers on lenses, prisms, and windows.

  • Infrared Optics: Thin films for IR detectors, imaging systems, and beam splitters.

  • Laser Systems: Optical coatings for high-power UV and IR laser components.

  • Semiconductor Industry: Protective dielectric films in electronic devices.

  • Research & Development: Optical thin film studies in universities and labs.

Technical Parameters

ParameterTypical Value / RangeImportance
Purity99.9% – 99.99%Higher purity ensures defect-free optical films
Forms AvailablePellets, granules, piecesAdaptable to different evaporation sources
Refractive Index~1.37 (at 550 nm)Ideal for anti-reflective applications
Transmission Range0.2 – 7 µmBroad spectrum optical use
Evaporation MethodThermal / e-beamFlexible for various thin film systems

Comparison with Related Materials

MaterialKey AdvantageTypical Application
Zinc Fluoride (ZnF₂)Good moisture resistance, broad IR useAnti-reflective coatings, IR optics
Magnesium Fluoride (MgF₂)Lower refractive index, excellent UV transparencyAR coatings, laser optics
Calcium Fluoride (CaF₂)High mechanical strength, wide IR rangeWindows, prisms, IR optics

FAQ

QuestionAnswer
What forms are available?Zinc Fluoride is offered as pellets, granules, and pieces to fit thermal and e-beam evaporators.
How is it packaged?Vacuum-sealed in moisture-proof containers with protective outer cartons or crates.
Can it be customized?Yes, purity level, size, and shape can be tailored for specific requirements.
What is the delivery time?Typically 2–3 weeks depending on order size and customization.
Which industries use it most?Optics, semiconductors, laser technology, and research institutions.

Packaging

Zinc Fluoride evaporation materials are moisture-sensitive and therefore carefully vacuum-sealed or packed in inert gas environments. Each container is labeled with purity, batch number, and specifications. Protective foam and export-safe cartons ensure safe transportation and storage.

Conclusion

The Zinc Fluoride Evaporation Materials provide a reliable source for producing high-quality thin films with excellent optical transparency, durability, and low refractive index. They are essential in advanced optical coatings, infrared systems, and semiconductor applications.

For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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