Tungsten Powder

Tungsten Powder (W Powder) is characterized by its elevated purity, fine particle size, low bulk density, uniform particles, heightened activity, expansive specific surface area, and remarkably low oxygen content post-treatment with inert gas. It easily disperses and finds widespread applications in various industries, notably aerospace alloys, electronic packaging alloys, electrode materials, microelectronic films, sintering aids, protective coatings, gas sensor electrodes, and more.

Tungsten Powder Overview

Tungsten powder is a crucial raw material in the production of tungsten alloys. This versatile powder can be processed into various forms including wires, rods, tubes, and plates. By blending tungsten powder with other metal powders, a range of tungsten alloys can be created, such as tungsten-cobalt, tungsten-rhenium, tungsten-copper, and high-density tungsten alloys.

TFM offers high-quality tungsten powder and tungsten carbide powders with exceptional density. If you don’t see the specific powder you need, please reach out to us. We can also customize powder sizes to meet your requirements.

Characteristics of Tungsten Powder

General Uses

Tungsten powder is widely employed in numerous applications, including:

  • Weight Fillers: Used in various products for increased weight.
  • Radiation Shielding: Ideal for radiation protection, particularly in polymer mixtures.
  • Metal Spray Industry: The unique particle shape and flowability make it suitable for metal spraying.
  • Cemented Carbide Tools: Essential in making tools for turning, milling, drilling, and molding.

Chemical Composition

The chemical composition of tungsten powder varies by grade. Here’s a summary:

GradeW Content (%)FeAlMgMnNiAsPbBiSnSbCuCaMoK+NaPCO
FW-1≥99.950.0050.0010.0020.0010.0010.0030.00150.00010.00010.00030.00010.00070.0020.0050.0030.0050.005
FW-2≥99.80.030.0040.0050.0040.0020.0040.0020.00050.00050.00050.0010.0010.0020.0050.0090.0040.01
FW-3≥99.80.030.0050.010.0040.0040.0050.0020.00070.00070.00070.0010.0020.0040.010.0030.0040.01

Special requirements can be arranged through discussions between the supplier and buyer.

Spherical Tungsten Powder

TFM also provides spherical tungsten powder ideal for 3D printing applications. This spherical form of tungsten powder boasts high density, a high melting point, excellent electrical and thermal conductivity, making it a top choice for electrical and microelectronic applications.

Physical Properties

Size15-53 um
Apparet density10.51 g/cm3
Tap density12.46 g/cm3
Hall flow rate5.82 s/50g

Chemical Composition

Chemical Composition – by ICP-AES
ElementWAlSiMgMnNiAsPb
Value (%)≥99.9<0.002<0.001<0.001<0.001<0.001<0.001<0.001
ElementSnSbCuCaMoK+Na
Value (%)<0.001<0.001<0.001<0.001<0.001<0.001
Gas Impurities
ElementCPON
Value (%)0.0020.0010.0150.003

Features

  • High Density
  • High Purity
  • High Melting Point

Applications of Tungsten Powder

Tungsten powder is used across various industries including:

  • Nuclear Applications
  • Automotive Industry
  • Medical Instruments
  • Metal Injection Molding (MIM)
  • Additive Manufacturing (AM)
  • Thermal Spray Applications (TSA)

Packaging

Tungsten powder is packed in iron drums, each containing 100kg or 200kg of powder, with plastic bags lining the inside to ensure quality and safety.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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