Aluminum Gaskets for ConFlat (CF) UHV Flanges

Aluminum Gaskets for ConFlat (CF) UHV Flanges

TFM’s Aluminum Gaskets for ConFlat (CF) UHV Flanges are specifically designed to provide reliable, leak-tight seals in ultra-high vacuum (UHV) applications. Made from high-quality aluminum, these gaskets are perfect for use in systems requiring robust and durable sealing performance. Aluminum gaskets are ideal for UHV systems, offering excellent performance in critical applications such as semiconductor manufacturing, scientific research, and vacuum technologies, where maintaining a stable and leak-free environment is essential.

Key Features

• Durable Aluminum Construction
  The gaskets are made from high-strength aluminum, providing a solid and durable material choice for UHV applications. This ensures long-lasting performance in demanding environments where seal integrity is crucial.

• Precision Fit for ConFlat (CF) UHV Flanges
  Designed for compatibility with ConFlat (CF) UHV flanges, these gaskets offer a precise fit, ensuring an even and effective seal across the entire sealing surface. This minimizes the risk of leaks and ensures the integrity of the vacuum system.

• Superior Leak-Tight Performance
  These aluminum gaskets are engineered to provide an excellent seal under UHV conditions. The reliable sealing helps prevent gas or fluid leakage, ensuring the optimal performance of high-precision systems.

• High Temperature and Pressure Resistance
  Aluminum gaskets are capable of withstanding a broad range of temperatures, making them suitable for various high-temperature applications. They perform effectively in both high-pressure and high-vacuum environments, providing flexibility in a variety of systems.

• Non-Contaminating
  Aluminum gaskets are often used in applications where cleanliness is critical. Their ability to maintain a clean and stable environment makes them ideal for sensitive processes, such as in semiconductor fabrication and vacuum coating.

Applications

• Ultra-High Vacuum (UHV) Systems
  Perfect for use in UHV systems, these aluminum gaskets provide a reliable sealing solution for critical systems in research and industrial applications, such as those found in high-energy physics laboratories, particle accelerators, and other vacuum-dependent environments.

• Semiconductor Manufacturing
  In semiconductor production, maintaining a clean and stable vacuum environment is vital. Aluminum gaskets are widely used in processes such as chemical vapor deposition (CVD), plasma etching, and thin-film deposition, ensuring long-lasting, leak-free performance.

• Scientific Research and Laboratories
  In research applications where ultra-high vacuum conditions are required, these aluminum gaskets play a key role in maintaining a consistent vacuum level, ensuring that sensitive experiments and equipment perform optimally without interference from leaks.

• Vacuum Coating and Thin Film Deposition
  Aluminum gaskets are also used in vacuum coating and thin-film deposition technologies, where it is critical to maintain a consistent, low-pressure environment. Their leak-tight sealing capabilities help achieve precise and uniform coating or deposition.

Specifications

• Material: High-quality aluminum

• Design: Gaskets for ConFlat (CF) UHV flanges

• Temperature Range: Suitable for a broad temperature range (typically -100°C to 400°C)

• Pressure Rating: Designed for UHV and HV environments

• Chemical Resistance: Moderate resistance to a variety of chemicals, ideal for controlled environments

• Compatibility: Specifically designed for ConFlat (CF) UHV flanges

Why Choose TFM?

TFM’s Aluminum Gaskets for ConFlat (CF) UHV Flanges offer exceptional performance in ultra-high vacuum applications. Their durable, high-quality construction ensures leak-tight seals in critical systems, providing peace of mind for industries requiring the utmost reliability. Whether you’re working in semiconductor manufacturing, scientific research, or vacuum technologies, TFM’s aluminum gaskets are a trusted choice for your UHV sealing needs.