Product Overview
Aluminum Lithium Sputtering Target (Al/Li) is an alloy sputtering target used to deposit composition-controlled alloy films. Relative to a pure elemental target, the alloying constituents are introduced to tune electrical, magnetic, optical, mechanical, or adhesion-related film properties. For this reason, alloy ratio, homogeneity, purity basis, and the intended film composition should be defined clearly in the procurement specification.
Material and Deposition Characteristics
Many alloy targets are electrically conductive and can be compatible with DC or pulsed-DC magnetron sputtering, subject to the actual alloy composition and equipment capability. The target composition is not always reproduced exactly in the deposited film because preferential sputtering, re-sputtering, substrate heating, and process gas conditions can shift the final ratio. For composition-sensitive work, deposited-film analysis should be part of process qualification.
Technical Data
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Purity | 99.9% – 99.99% | Ensures consistent thin film quality |
| Composition Ratio | Al/Li customizable (e.g., 95/5, 90/10) | Influences electrical and electrochemical properties |
| Density | ≥ 95% theoretical density | Provides stable sputtering performance |
| Diameter | 25 – 300 mm (custom) | Compatible with various sputtering systems |
| Thickness | 3 – 6 mm | Affects sputtering lifetime and thermal stability |
| Bonding | Copper backing plate optional | Improves heat transfer and target durability |
| Material | Key Advantage | Typical Application |
|---|---|---|
| Aluminum Lithium (Al/Li) | Extremely lightweight alloy with tunable electrochemical properties | Energy storage and advanced electronics |
| Aluminum (Al) | High electrical conductivity and low cost | General thin film coatings |
| Aluminum Copper (Al/Cu) | Improved strength and electromigration resistance | Semiconductor interconnects |
| Lithium (Li) | High electrochemical activity | Battery research |
| Question | Answer |
|---|---|
| Can the Aluminum Lithium Sputtering Target be customized? | Yes, composition ratios, dimensions, purity levels, and bonding options can be tailored according to sputtering system requirements. |
| Is lithium stable during sputtering? | When properly alloyed with aluminum and processed under controlled conditions, lithium can be deposited effectively in alloy thin films. |
| Are backing plates recommended for Al/Li targets? | Yes, copper backing plates help dissipate heat and improve target stability during sputtering. |
| Which deposition methods are compatible with this target? | Aluminum Lithium targets can be used in RF magnetron sputtering, DC sputtering, and other PVD systems. |
| Which industries use Al/Li sputtering targets? | Battery research laboratories, semiconductor industries, aerospace materials research, and advanced electronics development. |
Typical Thin-Film Applications
- Aluminum Lithium alloy films where composition control is important to electrical, mechanical, magnetic, or optical performance
- Multilayer stacks, adhesion/barrier layers, conductive films, or functional coatings depending on the alloy system
- Research and production programs that require customized alloy ratios and repeatable sputtering behavior
Target Configuration and Ordering Considerations
For quotation and manufacturability review, provide target size, thickness, purity or alloy composition, quantity, and the sputtering gun or cathode model if known. If a bonded assembly is required, include backing-plate material, bonding preference, and any dimensional tolerances, surface-finish needs, or inspection-document requirements. TFM can also review customer drawings or old-target samples for replacement builds.
Frequently Asked Questions
Can the composition of a Aluminum Lithium sputtering target be customized?
Yes. For alloy targets, the required ratio should be specified clearly in wt% or at%. TFM can review custom compositions together with purity, dimensions, and manufacturability.
Will an alloy target always produce a film with the same composition?
Not necessarily. Preferential sputtering, substrate heating, process gas, and re-sputtering effects can shift the deposited composition relative to the nominal target chemistry. Film analysis should be used when the composition is critical.
Is a Aluminum Lithium alloy target compatible with DC magnetron sputtering?
Many metallic alloy targets are electrically conductive and can be compatible with DC or pulsed-DC sputtering, but the final choice depends on the actual alloy system and equipment.
Why is alloy homogeneity important in a Aluminum Lithium target?
A uniform alloy distribution helps support stable erosion and reduces local composition variation across the target, which in turn helps improve run-to-run consistency.
Can a Aluminum Lithium target be supplied bonded?
Yes. Where the cathode or thermal load requires it, TFM can supply bonded assemblies. Backing-plate material, target thickness, bonding method, and operating power should be reviewed together.
What should I include in an RFQ for Aluminum Lithium?
Specify the alloy composition, purity basis, dimensions, quantity, backing requirement, cathode model or drawing, and any tolerance, inspection, or documentation requirements.
Reviews
There are no reviews yet.