Thin Film Materials Logo
Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors
Aluminum Oxide Evaporation Materials

VD0668 Aluminum Oxide Evaporation Materials, Al2O3

Catalog No.VD0668
MaterialAluminum Oxide (Al2O3)
Purity99.5%
ShapePowder/ Granule/ Custom-made

TFM stands out as a premier manufacturer and supplier of high-purity Al2O3 aluminum oxide evaporation materials. We provide a diverse range of evaporation materials, available in both powder and granule formats. Additionally, we offer customization options to meet specific needs.

MSDS File

Introduction

Aluminum Oxide (Al₂O₃) evaporation materials are widely used for producing high-quality dielectric and protective thin films in vacuum deposition processes. Known for their excellent chemical stability, high hardness, and optical transparency, Al₂O₃ coatings play a critical role in electronics, optics, and advanced surface engineering applications where insulation and durability are essential.

Detailed Description

Al₂O₃ evaporation materials are typically supplied in forms such as pellets, granules, tablets, or custom-shaped pieces to suit different evaporation sources, including resistive boats, crucibles, and electron beam systems. Due to its high melting point (~2050°C), aluminum oxide is commonly deposited using electron beam evaporation or high-temperature compatible sources.

The material exhibits strong dielectric properties, making it ideal for insulating layers in semiconductor and microelectronic devices. Its excellent adhesion to a wide range of substrates—including glass, silicon, and metals—ensures uniform film formation and long-term stability.

Careful control of particle size, density, and purity is essential to achieve consistent evaporation rates and minimize spitting or contamination during deposition. High-purity Al₂O₃ also ensures low defect density in optical coatings, improving film transparency and reliability.

Key features include:

  • High melting point and thermal stability for high-temperature deposition

  • Excellent dielectric properties for insulation layers

  • High optical transparency across a wide wavelength range

  • Strong adhesion to various substrates

  • Available in multiple forms (pellets, granules, pieces) for different evaporation systems

Applications

Aluminum Oxide evaporation materials are widely used in:

  • Optical coatings (anti-reflective layers, protective coatings)

  • Semiconductor devices (dielectric and insulating layers)

  • Thin film capacitors and microelectronics

  • Wear-resistant and corrosion-resistant coatings

  • Display technologies and touch panels

  • Research and development in thin film materials

Technical Parameters

ParameterTypical Value / RangeImportance
Chemical FormulaAl₂O₃Defines material composition
Purity99.9% – 99.99%Reduces contamination and defects
FormPellets / Granules / TabletsMatches evaporation source type
Particle Size1 – 6 mm (typical)Ensures stable evaporation
Melting Point~2050°CSuitable for high-temperature processes
Deposition MethodE-beam / Thermal (limited)Determines process compatibility

Comparison with Related Materials

MaterialKey AdvantageTypical Application
Al₂O₃Excellent insulation & durabilityOptical & dielectric films
SiO₂Lower refractive indexAnti-reflective coatings
MgF₂Very low refractive indexOptical coatings
HfO₂High dielectric constantAdvanced electronics

FAQ

QuestionAnswer
What evaporation method is recommended for Al₂O₃?Electron beam evaporation is preferred due to its high melting point.
Can the material be customized in shape and size?Yes, pellets, granules, and custom forms are available.
Is Al₂O₃ suitable for optical coatings?Yes, it offers excellent transparency and durability.
How is purity controlled?Through refined powder processing and strict quality control during manufacturing.
Which industries use Al₂O₃ evaporation materials?Semiconductor, optics, display, and protective coating industries.

Packaging

Our Aluminum Oxide Evaporation Materials are meticulously tagged and labeled externally to ensure efficient identification and maintain high standards of quality control. We take great care to prevent any potential damage during storage and transportation, ensuring the materials arrive in perfect condition.

Conclusion

Aluminum Oxide (Al₂O₃) evaporation materials offer a reliable solution for producing durable, high-performance dielectric and optical coatings. With excellent thermal stability, insulation properties, and customizable forms, they are an essential material in modern thin film deposition technologies.

For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

Ordering Table

Material Size Quantity Purity Part Number
Aluminum Oxide 1mm - 2.5mm Pieces 1 kg 99.99% EVMALO-1-2.5
Aluminum Oxide 1mm - 2.5mm Pieces 100 g 99.99% EVMALO-1-2.5D
Aluminum Oxide 1mm - 3mm Pieces 25 g 99.99% EVMALO1-3MMA
Aluminum Oxide 1mm - 3mm Pieces 50 g 99.99% EVMALO1-3MMB
Aluminum Oxide 1mm - 3mm Pieces 100 g 99.99% EVMALO1-3MMD
Aluminum Oxide 1mm - 3mm Pieces 1 kg 99.99% EVMALO1-3MMKG
Aluminum Oxide 1mm - 3mm Pieces 500 g 99.99% EVMALO1-3MMT
Aluminum Oxide 1mm - 5mm Pieces 1 lb 99.99% EVMALO-1220
Aluminum Oxide 1mm - 5mm Pieces 25 g 99.99% EVMALO-1220A
Aluminum Oxide 1mm - 5mm Pieces 50 g 99.99% EVMALO-1220B
Aluminum Oxide 1mm - 5mm Pieces 100 g 99.99% EVMALO-1220D
Aluminum Oxide 1mm - 5mm Pieces 1 kg 99.99% EVMALO-1220KG
Aluminum Oxide 1mm - 5mm Pieces 500 g 99.99% EVMALO-1220T

Reviews

There are no reviews yet.

Be the first to review “VD0668 Aluminum Oxide Evaporation Materials, Al2O3”

Your email address will not be published. Required fields are marked *

Related Products

Related products

FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

Shopping Cart
Scroll to Top