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ST0319 Bismuth Telluride Sputtering Target, Bi2Te3

Chemical Formula: Bi2Te3
Catalog Number: ST0319
CAS Number: 1304-82-1
Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Bismuth Telluride sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Bismuth Telluride Sputtering Target Description

A Bismuth Telluride Sputtering Target is a type of ceramic material composed of bismuth and tellurium, used in sputtering processes. This target is typically employed in thin film deposition and various specialized applications due to the unique properties of the bismuth-tellurium combination.

BismuthBismuth is a chemical element with the symbol “Bi” and an atomic number of 83. The name “bismuth” originates from the German word ‘Bisemutum,’ a corruption of ‘Weisse Masse,’ meaning white mass. It was first used in 1753 and discovered by Claude François Geoffroy. Bismuth is located in Period 6 and Group 15 of the periodic table, belonging to the p-block elements. Its relative atomic mass is approximately 208.98040 Daltons, with the number in parentheses indicating a margin of uncertainty.

Related Product: Bismuth Sputtering Target

TelluriumTellurium is a chemical element with the symbol “Te” and an atomic number of 52. The name “tellurium” is derived from the Latin word ‘tellus,’ meaning Earth. It was first mentioned in 1782 and observed by Franz-Joseph Müller von Reichenstein. The isolation of tellurium was later accomplished and announced by Martin Heinrich Klaproth. Tellurium is located in Period 5 and Group 16 of the periodic table, classified within the p-block elements. Its relative atomic mass is approximately 127.60 Daltons, with the number in parentheses indicating a margin of uncertainty.

Bismuth Telluride Sputtering Target Specification

Compound FormulaBi2Te3
Molecular Weight800.76
AppearanceGray Solid
Melting Point585 °C
Boiling PointN/A
Density7.642 g/cm3
Available SizesDia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Bismuth Telluride Sputtering Target Handing Notes

1. Indium bonding is recommended for Bismuth Telluride Sputtering Targets due to certain characteristics such as brittleness and low thermal conductivity, which make them less amenable to sputtering.

2. Bismuth Telluride has low thermal conductivity and is susceptible to thermal shock.

Packing

Our Bismuth Telluride Sputtering Targets are meticulously tagged and labeled externally to ensure efficient identification and maintain stringent quality control. We take great care to prevent any potential damage during storage and transportation, ensuring the targets arrive in perfect condition.

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TFM offers Bismuth Telluride Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

It’s the source material (in solid form) used in sputter deposition to eject atoms or molecules that then form a thin film on a substrate.

Targets can be pure metals (e.g., gold, copper, aluminum), ceramics (e.g., Al₂O₃, SiO₂, TiO₂), alloys, or composites—chosen based on the film’s desired properties.

 

They are produced by processes such as melting/casting for metals or sintering (often with hot isostatic pressing) for ceramics and composite targets to ensure high density and purity.

 

In a vacuum chamber, a plasma (typically argon) bombards the target, ejecting atoms that travel and condense on a substrate, forming a thin film.

 

Key factors include the target’s purity, density, grain structure, and the sputtering yield (i.e. how many atoms are ejected per incident ion), as well as operating conditions like power density and gas pressure.

 

Operators monitor target erosion (often by measuring the depth of the eroded “race track”) or track total energy delivered (kilowatt-hours) until it reaches a threshold that can compromise film quality.

 

Fragile materials (such as many ceramics or certain oxides) and precious metals often require a backing plate to improve cooling, mechanical stability, and to allow thinner targets that reduce material costs.

 

DC sputtering is used for conductive targets, while RF sputtering is necessary for insulating targets (like many oxides) because it prevents charge buildup on the target’s surface.

 

In reactive sputtering, a reactive gas (e.g., oxygen or nitrogen) is introduced to form compound films on the substrate, but it may also “poison” the target surface if not carefully controlled.

 

Many manufacturers prefer to control raw material quality by sourcing their own powders; using external powders can risk impurities and inconsistent target properties.

 

Targets should be stored in clean, dry conditions (often in original packaging or re-wrapped in protective materials) and handled with gloves to avoid contamination, ensuring optimal performance during deposition.

Deposition rate depends on factors such as target material and composition, power density, working gas pressure, substrate distance, and the configuration of the sputtering system (e.g., magnetron design).

 
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