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calcium-fluoride

VD0775 Calcium Fluoride Evaporation Materials, CaF2

Catalog No.VD0775
MaterialCalcium Fluoride (CaF2)
Purity99.9% ~ 99.99%
ShapePowder/ Granule/ Custom-made

TFM is a top provider of high-purity Calcium Fluoride and an extensive range of evaporation materials. Our product line is available in both powder and granule forms, with customized options available upon request to meet specific needs.

MSDS File

Calcium Fluoride Evaporation Materials Overview

TFM provides high-purity Calcium Fluoride evaporation materials, known for their excellent role in deposition processes. With the chemical formula CaF2, these fluoride ceramic materials ensure the production of high-quality films during evaporation. TFM specializes in producing Calcium Fluoride materials with up to 99.9995% purity, following strict quality control procedures to guarantee consistent product performance.

Related Products:

  • Calcium Evaporation Materials
  • Fluoride Ceramic Evaporation Materials

Specifications of Calcium Fluoride Evaporation Materials

  • Material Type: Calcium Fluoride
  • Chemical Symbol: CaF2
  • Appearance: White, crystalline solid
  • Melting Point: 1,418°C (2,584°F; 1,691 K)
  • Density: 3.18 g/cm³
  • Purity: 99.9% to 99.99%
  • Available Forms: Powder, Granules, or Custom shapes

Applications of Calcium Fluoride Evaporation Materials

Calcium Fluoride evaporation materials are widely used in advanced deposition techniques, such as semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD). They are essential for applications in optics, including wear protection, decorative coatings, and display manufacturing.

Packaging Information

TFM ensures that all Calcium Fluoride evaporation materials are properly labeled and tagged for easy identification and to maintain quality control. Special care is taken to prevent damage during transportation and storage.

Contact Information

TFM is a trusted manufacturer and supplier of high-purity Calcium Fluoride evaporation materials, offering a wide range of shapes including tablets, granules, rods, and wires. Custom sizes and quantities are also available upon request. Additionally, TFM provides a variety of evaporation tools such as sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. Feel free to contact us for pricing details or inquiries about other materials not listed.

Ordering Table

Material Size Quantity Purity Part Number
Calcium Fluoride 1-4mm Pieces, Crystalline 1kg 99.99% EVMCAF1-4KG
Calcium Fluoride 1mm - 4mm 25g 99.99% EVMCAF1-4A
Calcium Fluoride 1mm - 4mm 50g 99.99% EVMCAF1-4B
Calcium Fluoride 1mm - 4mm 100g 99.99% EVMCAF1-4D
Calcium Fluoride 1mm - 4mm 250g 99.99% EVMCAF1-4J
Calcium Fluoride 1mm - 4mm 500g 99.99% EVMCAF401-4T

 

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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