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CF Flanged Bellows Sealed Angle Valves (Manual)

Dependable, cost-efficient components for HV and UHV applications, focusing on cleanliness and corrosion resistance.

  • In the open position, edge-welded bellows and valve seats are positioned outside the gas flow, ensuring high conductance.
  • Capable of enduring intermittent baking at temperatures up to 200°C (150°C continuous), which enhances ultimate vacuum performance.

Features:

  • Includes fluorocarbon O-ring seat seals, bellows-sealed shafts, and bonnet seals (copper options available for higher-temperature bakeout and better ultimate vacuum).
  • Repairs can be performed without removing the valve body from the system.

Specifications Table

ManufacturerTFM
PressureTorr
7.520 x 10-9 Torr
mbar
1.000 x 10-8 mbar
RatesLeak Rate
2.000 x 10-9 mbar*L/s
1.504 x 10-9 Torr*L/s
TemperatureActuator
80.0 ºC
176 ºFClosed Bake
100 ºC
212 ºFOpen Bake
100 ºC
212 ºF
Bonnet
Seal Type
Fluorocarbon (FKM)
Valve Body
Material
304L SS
Poppet
Material
Fluorocarbon (FKM)
Shaft
Seal
Welded Bellows

Ordering Table

Drawing Flange Size Bonnet Seal Type Note Part Number
Tooltip DN16CF (1.33" OD) Copper Limited availability and specially priced. SA0075MCCF
Tooltip DN16CF (1.33" OD) Fluorocarbon (FKM) SA0075MVCF
Tooltip DN35CF-DN40CF (2.75" OD) Copper SA0150MCCF
Tooltip DN35CF-DN40CF (2.75" OD) Fluorocarbon (FKM) SA0150MVCF
Tooltip DN63CF (4.50" OD) Copper SA0250MCCF

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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