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Chromium Cobalt Evaporation Materials, Cr/Co

Material: Chromium Cobalt (Cr/Co)
Chemical Formula: Cr/Co
Catalog No.: TFM-EVM-0065
Purity: 99.9% ~ 99.95%
Shape: Powder/ Granule/ Custom-made

Chromium Cobalt (Cr/Co) evaporation material is supplied by Thin Film Materials (TFM) for vacuum evaporation and thin-film deposition. Available form, size, purity, and packaging can be customized to suit research and production requirements.

Product Overview

Chromium Cobalt Evaporation Materials (Cr/Co) is an alloy evaporation material intended for depositing multi-element metallic films. Unlike a pure element, an alloy may not evaporate congruently because its constituents can have different vapor pressures. As a result, source composition, evaporation method, deposition rate, and film-composition verification should be considered together; for very composition-sensitive films, co-evaporation from separate sources may be evaluated.

Evaporation Behavior and Process Considerations

Different alloying elements may evaporate at different rates because their vapor pressures are not identical. This can cause the source surface and deposited film to drift away from the nominal alloy composition during a run. For demanding composition control, film analysis, source replenishment strategy, or co-evaporation from separately controlled sources may be more reliable than assuming one alloy charge will evaporate congruently.

Technical Data

ParameterTypical Value / RangeImportance
Purity99.9% – 99.99% (3N–4N)Reduces defect formation and contamination
CompositionCustom Cr/Co ratio (wt% or at%)Controls magnetic and mechanical behavior
FormPieces / Granules / PelletsCompatible with evaporation systems
Melting Range~1400–1900°C (composition-dependent)Influences evaporation method selection
Density≥ 99% theoretical (alloyed form)Promotes uniform vaporization
PackagingVacuum-sealed / inert-packedPrevents surface oxidation
MaterialKey AdvantageTypical Application
Chromium Cobalt (Cr/Co)Balanced magnetic strength & corrosion resistanceMagnetic & protective films
Pure Cobalt (Co)Strong ferromagnetismMagnetic recording layers
Pure Chromium (Cr)Excellent hardness & oxidation resistanceAdhesion & barrier layers
Cobalt Nickel (Co/Ni)Tunable magnetic propertiesSpintronic devices
QuestionAnswer
Can the Cr/Co ratio be customized?Yes, alloy composition can be tailored to achieve specific magnetic or mechanical properties.
Is the material pre-alloyed?Yes, standard products are supplied as pre-alloyed materials to ensure uniform evaporation.
What deposition methods are suitable?Compatible with thermal and electron beam evaporation systems.
Are custom sizes available?Yes, particle size and pellet dimensions can be customized according to equipment requirements.
Which industries use Cr/Co films most?Magnetic storage research, electronics, protective coatings, and advanced materials R&D.

Typical Thin-Film Applications

  • Composition-tuned alloy films for electrical, magnetic, optical, or mechanical functionality
  • Multilayer and thin-film metallization studies
  • R&D where alloy ratio or co-evaporation strategy is part of the process design

Source Form and Ordering Considerations

For quotation, provide material, purity, source form, particle or piece size, quantity, evaporation method, and any boat, basket, crucible, or e-beam hearth constraints. If the material will be used for a specific coating stack, sharing the intended film thickness or deposition application can help with source-form selection and packaging recommendations.

Frequently Asked Questions

Will Chromium Cobalt evaporate with the same composition as the bulk alloy?

Not necessarily. Alloy constituents can have different vapor pressures, so the vapor and deposited film may become enriched in the more volatile component as evaporation proceeds.

When is co-evaporation preferable to using a Chromium Cobalt alloy source?

Co-evaporation can be preferable when precise film composition must be maintained independently because separate source rates can be controlled and adjusted during deposition.

Can Chromium Cobalt be evaporated by electron beam?

Often yes, especially when the alloy requires high source temperature. The actual behavior depends on melting, segregation, evaporation rate, and whether the constituents remain sufficiently mixed in the melt.

How should film composition be verified for Chromium Cobalt?

For composition-critical films, analytical verification such as EDS, XRF, XPS, or another appropriate method should be used rather than assuming the film exactly matches the source alloy.

What source form is suitable for Chromium Cobalt evaporation?

Pieces, pellets, or granules may be supplied depending on the source holder. A stable charge geometry helps reduce movement and sudden changes in the heated surface.

What should I include in a Chromium Cobalt evaporation-material RFQ?

Specify alloy ratio, purity basis, source form and size, quantity, evaporation method, and the required film-composition tolerance if it is important.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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