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Germanium Evaporation Materials

VD0549 Germanium Evaporation Materials, Ge

Material Type: Germanium
Symbol: Ge (N-type)
Color/Appearance: Grayish White, Semi-Metallic
Purity: 99.9% ~ 99.999%
Shape: Powder/ Granule/ Custom-made

TFM is a top manufacturer and supplier of high-purity germanium evaporation materials, offering a broad selection of other evaporation materials as well. Our products are available in powder and granule forms, with customizable options to meet specific requirements.

 

MSDS File

Germanium Evaporation Materials Description

Germanium is a brittle, grayish-white semi-metal known for its high reactivity. Unlike some elements, it is not found in its pure form naturally on Earth but is commercially extracted from sources such as zinc ores, specific coals, argyrodite, and germanite. As a semiconductor, germanium is extensively used in the production of transistors, solar cells, and optical materials.

With a density of 5.35 g/cc, a melting point of 937°C, and a vapor pressure of 10⁻⁴ Torr at 1,167°C, germanium is categorized as a metalloid. It shares properties with both metals and non-metals and is commonly used in the manufacturing of transistors and integrated circuits, much like silicon.

High-purity germanium evaporation materials are essential for deposition processes, ensuring the creation of superior quality deposited films. TFM excels in producing germanium evaporation materials with purity levels up to 99.999%, supported by stringent quality assurance measures to ensure product reliability.

germanium evaporation materials

Germanium Evaporation Materials Specification

Material TypeGermanium
SymbolGe
Color/AppearanceGrayish White, Semi-Metallic
Melting Point973 °C
SputterRF, DC
Density5.32 g/cc
Thermal Conductivity60 W/m.K
SynonymsGe Pellets, Ge Pieces, Ge Evaporation Pellet, Germanium Pellets, Germanium Pieces, Germanium Evaporation Pellet

Germanium Evaporation Materials Application

Germanium is utilized in various deposition processes, including semiconductor deposition, Chemical Vapor Deposition (CVD), and Physical Vapor Deposition (PVD). These methods are critical for producing high-quality thin films and coatings. Additionally, germanium is used in optics for several applications, such as enhancing wear resistance, applying decorative coatings, and improving display technologies.

Germanium Evaporation Materials Packaging

We carefully handle our germanium evaporation materials to prevent damage during storage and transportation, ensuring that their quality remains intact and they arrive in optimal condition.

Ordering Table

VD0549 Germanium Evaporation Materials, Ge

Material Size Quantity Purity Part Number
Germanium 3-6mm Pieces 50g 99.999% EVMGE-1038B
Germanium 3-6mm Pieces 100g 99.999% EVMGE-1038D
Germanium 3-6mm Pieces *Per gram (20g min.) 99.999% EVMGE50500GM
Germanium 3-6mm Pieces 1kg 99.999% EVMGE50500KG
Germanium 3-6mm Pieces 500g 99.999% EVMGE50500T

 

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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