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Indium Arsenide Wafer (InAs)

Indium Arsenide Wafer (InAs)

MSDS File

Overview of Indium Arsenide Wafer (InAs)

Indium Arsenide (InAs) single crystals serve as a high-quality substrate material for fabricating InAsSb/InAsPSb materials, used in infrared light-emitting devices. These wafers are critical in gas detection and low-loss fiber communication. Furthermore, due to their high electron mobility, InAs crystals are ideal for manufacturing Hall devices, offering significant application potential in various advanced technologies.

Physical Properties of Indium Arsenide Wafer (InAs)

  • Material: InAs
  • Growth Method: LEC (Liquid Encapsulated Czochralski)
  • Lattice Constant: a = 6.058 Å
  • Structure: M3
  • Melting Point: 942°C
  • Density: 5.66 g/cm³
  • Doped Materials: Undoped, Sn-doped, S-doped, Zn-doped
  • Type: N, N, N, P
  • Carrier Concentration:
    • Undoped: 5 x 10¹⁶ cm⁻³
    • Sn-doped: (5-20) x 10¹⁷ cm⁻³
    • S-doped: (1-10) x 10¹⁷ cm⁻³
    • Zn-doped: (1-10) x 10¹⁸ cm⁻³
  • Mobility:
    • Undoped: ≥ 2 x 10⁴ cm²/V·s
    • Sn-doped: 7000-20000 cm²/V·s
    • S-doped: 6000-20000 cm²/V·s
    • Zn-doped: 100-400 cm²/V·s
  • EPD (Average): < 5 x 10⁴/cm²

Specifications of Indium Arsenide Wafer (InAs)

  • Size: Available in 2″ Dia, 3″ Dia, 4″ Dia (custom sizes available upon request)
  • Thickness: 500 µm, 600 µm, 800 µm (Tolerance: ±25 µm)
  • Polished: SSP or DSP
  • Orientation: <100>, <111>
  • Redirection Precision: ±0.5°
  • Primary Flat Length: 16±2 mm, 22±2 mm, 32.5±2 mm
  • Secondary Flat Length: 8±1 mm, 11±1 mm, 18±1 mm
  • TTV (Total Thickness Variation): <10 µm
  • Bow: <10 µm
  • Warp: <15 µm

Packaging of Indium Arsenide Wafer (InAs)

Indium Arsenide wafers are carefully packaged in a class 100 clean bag or wafer container within a class 1000 clean room environment to ensure optimal cleanliness and prevent contamination.

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FAQ

A thin film substrate is the base material upon which thin layers of materials are deposited to create electronic, optical, or mechanical devices. The substrate provides structural support and can influence the properties of the thin film.

The choice of substrate affects the film’s structural integrity, electrical properties, and overall performance. Factors like thermal expansion coefficient, surface smoothness, and chemical compatibility are crucial considerations.

Materials such as lanthanum aluminate (LaAlO₃), magnesium oxide (MgO), and strontium titanate (SrTiO₃) are commonly used due to their lattice compatibility and thermal stability, which are essential for optimal superconducting properties.

Metal substrates offer high electrical and thermal conductivity, making them suitable for applications requiring efficient heat dissipation and electrical connectivity. However, their surface properties and potential for oxidation must be managed during deposition.

These substrates are materials that can support the growth of thin films exhibiting magnetic or ferroelectric properties, essential for applications in memory devices, sensors, and actuators.

Semiconductor substrates, such as silicon wafers, serve as the foundation for integrated circuits and various electronic components, providing the necessary electrical characteristics and structural support for device fabrication.

Gallium Nitride (GaN) substrates are pivotal for high-performance optoelectronic and power devices due to their excellent thermal conductivity, high breakdown voltage, and efficiency. They are widely used in LEDs, power transistors, and RF components.

Halide crystal substrates, composed of halide compounds, are utilized in specialized optical applications, including infrared spectroscopy and laser systems, due to their unique optical properties.
Ceramic substrates provide high thermal stability, mechanical strength, and electrical insulation, making them ideal for high-frequency and high-power applications.
Proper surface preparation, including cleaning and polishing, ensures the removal of contaminants and surface irregularities, leading to improved film adhesion, uniformity, and performance.
Yes, thin films can be deposited on flexible substrates like polymers, enabling the development of flexible electronics and wearable devices. However, challenges include managing mechanical stress and ensuring film adhesion.
Challenges include ensuring lattice matching to minimize defects, managing thermal expansion differences to prevent stress and delamination, and achieving desired electrical and optical properties for specific applications.
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