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KF/ISO Flanged Stainless Steel Bellows Sealed with Elastomer Bonnet Inline Valves (Manual)

Key Features
  • Moderate Conductance: Inline valves offer moderate conductance due to the gas flow taking two 90-degree turns as it passes through the valve.
  • Ideal for Offset Connections: Designed for applications where a direct, line-of-sight connection between two offset ports is required.
  • Superior Sealing Technology: These valves are equipped with fluorocarbon o-ring seat seals, bellows-sealed shafts, and bonnet seals for enhanced sealing performance.
  • Low Leak Rate: The valves maintain a low leak rate across the seat, measured at 2×10⁻⁹ mbar L/s, ensuring optimal performance in sensitive systems.
  • Pressure Capabilities:
    • Maximum pressure: Atmospheric pressure
    • Minimum pressure: 1×10⁻⁹ Torr
  • Convenient Maintenance: Standard repairs can be performed without needing to remove the valve body from the system, reducing downtime.
  • Actuation Options: Available in both manual and pneumatic actuation for versatile use.

Ordering Table

Drawing Flange Size Max Conductance (L/Sec.) Dim A (in.) Dim B (in.) Dim C (in.) Dim D (in.) Dim E (in.) Part Number
Tooltip KF10 - 1.65 0.94 1.5 4.44 2.25 SL0037MVQF
Tooltip KF16 4 2.15 1.12 1.87 5.19 2.25 SL0075MVQF
Tooltip KF25 13 2.03 1.37 2.25 5.69 2.25 SL0100MVQF
Tooltip KF40 42 2.4 1.88 3.12 8.02 3 SL0150MVQF
Tooltip KF50 72 3.4 2.62 4.12 10.73 3.5 SL0200MVQF
Tooltip ISO63 - 3.25 3.12 4.93 12.7 4 SL0250MVIK

Accessories Table

Type Description Part Number
Clamp CLAMP, ALUMINUM, QF16, CAST 1/2" & 3/4" QF16-075-C
Centering Ring CENTERING RING, SS, QF16, FKM O-RING, 3/4" QF16-075-SRV
Clamp CLAMP, ALUMINUM, QF40, CAST 1-1/2" QF40-150-C
Fluorocarbon Centering Ring CENTERING RING, SS, QF40, FKM QF40-150-SRV
Clamp CLAMP, ALUMINUM, QF50, CAST 2" QF50-200-C
Centering Ring CENTERING RING, SS, QF50, FKM QF50-200-SRV
Clamp CLAMP, ALUMINUM, QF25, CAST 1" QF25-100-C
Centering Ring CENTERING RING, SS, QF25, FKM QF25-100-SRV
Centering Ring CENTERING RING, SS, QF10, FKM QF10-050-SRV
Centering Ring (SS/AL with Fluorocarbon O-Ring) CENTERING RING, QF63, SS INNER, AL OUTER, FKM O-RING QF63-SAVR
Centering Ring (SS/AL with Fluorocarbon O-Ring) CENTERING RING, QF80, SS INNER, AL OUTER, FKM O-RING QF80-SAVR
Double Clamps (AL) CLAMP, DOUBLE CLAW, ALUMINUM, FOR 63-100 ISO FLANGES QF-SDC-AL1

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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