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ST0441 Lanthanum Barium Manganate Sputtering Target, La(1-x)BaxMnO3

Chemical Formula: La(1-x)BaxMnO3
Catalog Number: ST0441
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Lanthanum Barium Manganate sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Lanthanum Barium Manganate Sputtering Target Description

Lanthanum barium manganate sputtering targets consist of lanthanum, barium, manganese, and oxygen. These high-purity targets are essential in deposition processes to produce top-quality thin films. TFM focuses on manufacturing sputtering targets with purities up to 99.9995%, utilizing rigorous quality assurance procedures to ensure product reliability and performance.

LanthanumBariummanganeseOxygen

Related products: Lanthanum Sputtering Target, Barium Sputtering Target, Manganese Sputtering Target

Lanthanum Barium Manganate Sputtering Target Specification

Material TypeLanthanum Barium Manganate
SymbolLa(1-x)BaxMnO3, LBM
Color/AppearanceSolid
Melting PointN/A
DensityN/A
Type of BondElastomer, Indium
Available SizesDia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets; please Contact Us for more information.

Lanthanum Barium Manganate Sputtering Target Application

The lanthanum barium manganate sputtering target is utilized in various applications, including thin film deposition, decorative coatings, semiconductors, displays, LEDs, and photovoltaic devices. It is also employed in functional coatings and various optical information storage industries, as well as for glass coating in automotive and architectural glass, and optical communication technologies.

Lanthanum Barium Manganate Sputtering Target Packing

Our lanthanum barium manganate sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. We take great care in handling these targets to prevent any damage during storage or transportation, preserving the quality of our products in their original condition.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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