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Lanthanum Strontium Copper Oxide Sputtering Target

MSDS File
Material TypeLanthanum Strontium Copper Oxide
SymbolLa(1-x)SrxCuO4
Color/AppearanceVarious colors, Solid
Melting Point (°C)N/A
Relative Density (g/cc)>90%
Z RatioN/A
SputterRF, RF-R, DC
Max Power Density*
(Watts/Square Inch)		N/A
Type of BondIndium, Elastomer

Lanthanum Strontium Copper Oxide Sputtering Targets

Applications

Lanthanum Strontium Copper Oxide (LSCO) sputtering targets are primarily used in the fabrication of thin films for various advanced electronic applications. These include:

  • Ferroelectric Materials
  • Gate Dielectrics
  • For CMOS Devices

Features

  • High Purity: Ensures consistent film quality and superior performance in critical applications.
  • Custom Sizes Available: Tailored to meet the precise needs of your project.

Manufacturing Process

  • Cold Pressing & Sintering: Targets are manufactured using cold pressing and sintering techniques to achieve optimal density and material integrity.
  • Elastomer Bonding: Elastomer bonding to the backing plate ensures stability during sputtering processes.
  • Cleaning & Final Packaging: Targets are thoroughly cleaned for vacuum use and packaged with protection from environmental contaminants to ensure quality during shipment.

Options Available

  • Purity: 99.9% minimum purity for high-performance results.
  • Smaller Sizes for R&D: Custom sizes available for research and development applications.
  • Sputtering Target Bonding Service: Available for enhanced target stability and performance.

For more information or to inquire about specific requirements, please contact us.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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