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VD0714 Magnesium Oxide Evaporation Materials, MgO

Material Type： Magnesium Oxide
Symbol： MgO
Color/Appearance： White, Crystalline Solid
Purity：99.9% ~ 99.99%
Shape：Powder/ Granule/ Custom-made

Thin-Film Mat Engineering (TFM) is a reliable source for high-purity magnesium oxide (MgO) evaporation materials, along with a comprehensive selection of other evaporation materials. We provide MgO in both powder and granule formats, catering to your specific needs and simplifying your application process.

MSDS File

Magnesium Oxide Evaporation Materials Overview

Thin-Film Mat Engineering (TFM) offers high-purity magnesium oxide (MgO) evaporation materials, essential for producing high-quality films. With a chemical formula of MgO, our evaporation materials boast exceptional purity levels, reaching up to 99.9995%, and are manufactured with rigorous quality assurance to ensure reliability.

Product Range

Specifications

Material TypeMagnesium oxide
SymbolMgO
Color/AppearanceWhite, Crystalline Solid
Melting Point2,852 °C
Theoretical Density 3.58 g/cm3
Purity99.9% ~ 99.99%
ShapePowder/ Pellets/ Granule/ Custom-made

Applications

Our magnesium oxide evaporation materials are crucial for various deposition processes, including:

  • Chemical Vapor Deposition (CVD)
  • Physical Vapor Deposition (PVD)

These high-purity materials find use in:

  • Optical Coatings: Enhancing reflectivity, wear resistance, and durability.
  • Semiconductor Industry: Vital for thin film deposition.
  • Decorative Coatings: Adding aesthetic and protective features.

Packaging and Handling

Our magnesium oxide materials are meticulously packaged and labeled to ensure safe handling and product integrity during storage and transport.

Contact Us

Thin-Film Mat Engineering (TFM) provides high-purity magnesium oxide evaporation materials in various shapes and custom options, including tablets, granules, rods, and wires. We also offer evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For the latest pricing and custom orders, please get in touch with us directly.

Ordering Table

Material Size Quantity Purity Part Number
Magnesium Oxide 3mm - 6mm Pieces 50 g 99.95% EVMMGO3-6MMB
Magnesium Oxide 3mm - 6mm Pieces 500 g 99.95% EVMMGO3-6MMT

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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