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Manganese(II) Fluoride Evaporation Materials

VD0786 Manganese(II) Fluoride Evaporation Materials, MnF2

Catalog No.VD0786
MaterialManganese Fluoride (MnF2)
Purity99.9%
ShapePowder/ Granule/ Custom-made

TFM is a trusted manufacturer and supplier of high-purity manganese(II) fluoride evaporation materials. Along with manganese(II) fluoride, we offer a wide selection of evaporation materials to meet various industrial needs. Our products are available in both powder and granule forms for flexibility in application. We also provide custom formulations upon request to accommodate specific project requirements.

MSDS File

Manganese(II) Fluoride Evaporation Materials by TFM

Manganese(II) fluoride evaporation materials from TFM are high-purity fluoride ceramics, represented by the chemical formula MnF2. These materials are essential in deposition processes, where they contribute to the formation of high-quality thin films. TFM specializes in delivering MnF2 evaporation materials with purities as high as 99.9995%, utilizing advanced quality assurance processes to ensure consistent performance and reliability.

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Manganese(II) Fluoride Evaporation Materials Specification

Material TypeManganese(II) Fluoride
SymbolMnF2
Appearance/ColorPale pink crystalline
Melting Point856 °C (1,573 °F; 1,129 K)
Density3.98 g/cm3
Purity99.9%
ShapePowder/ Granule/ Custom-made

Applications of Manganese(II) Fluoride Evaporation Materials

Manganese(II) fluoride evaporation materials are widely used in various deposition processes, including semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD). They are particularly valued in optical applications for wear protection, decorative coatings, and display technologies, thanks to their excellent optical and material properties.

Packaging of Manganese(II) Fluoride Evaporation Materials

At TFM, all manganese(II) fluoride evaporation materials are securely packaged and clearly labeled to ensure proper identification and strict quality control. We take great care to prevent any potential damage during storage or transportation, ensuring the materials reach their destination in top condition.

Get in Touch

TFM is a leading provider of high-purity manganese(II) fluoride evaporation materials. We offer a variety of shapes, including tablets, granules, rods, and wires. Custom shapes and quantities are also available upon request. In addition, we supply a range of evaporation sources, such as boats, filaments, crucibles, heaters, and e-beam crucible liners. Please contact us for current pricing or information on additional materials that may not be listed.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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