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Manual SS Y Inline Valves (CF Flanged; Viton Bonnet)

Reliable and Economical Components for HV and UHV Applications

These valves are designed for high-vacuum (HV) and ultra-high-vacuum (UHV) environments where cleanliness and corrosion resistance are essential. Offering a cost-effective and reliable solution, they are ideal for general-purpose use.

High Conductance in Open Position

When the valve is open, the edge-welded bellows and valve seat are retracted from the gas path, ensuring optimal gas flow and achieving high conductance.

Key Features:

  • Leak Rate: Low leak rate across the seat at 2×10⁻⁹ mbar L/s, making it suitable for vacuum-sensitive applications.
  • Pressure Range:
    • Maximum pressure: Atmospheric pressure
    • Minimum pressure: 1×10⁻⁹ Torr
  • Sealing Options: Includes fluorocarbon o-ring seat seals, bellows-sealed shafts, and bonnet seals. For higher temperature bakeout and enhanced vacuum performance, copper seals can be selected.
  • Actuation Options: Available in both manual and pneumatic actuation to accommodate different system needs.
  • Easy Maintenance: Standard repairs can be performed without removing the valve body, reducing downtime and making maintenance hassle-free.

Specifications Table

ManufacturerTFM
PressureTorr
Min: 1.000 x 10-9 Torr
Max: 760 Torrmbar
1.330 x 10-9 mbar
atm
1.00 atm
RatesHelium Leak Rate
2.000 x 10-9 mbar*L/s
1.500 x 10-9 Torr*L/s
TemperatureActuator
80.0 ºC
176 ºFClosed Bake
100 ºC
212 ºFOpen Bake
100 ºC
212 ºF
Actuator
Type
Manual
Bonnet
Seal Type
Viton
Valve Body
Material
304L SS
Valve Seal
Material
Viton
Shaft
Seal
Bellows

Ordering Table

Drawing Flange Size Bonnet Seal Type Part Number Accessories
Tooltip DN16CF (1.33" OD) Viton SY0075MVCFView SY0075MVCF Specific Information View Available Accessories
Tooltip DN35CF-DN40CF (2.75" OD) Viton SY0150MVCFView SY0150MVCF Specific Information View Available Accessories

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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