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VD0867B Mercury Sulfide Pellet Evaporation Material (HgS)

MSDS File
Material TypeMercury Sulfide
SymbolHgS
Color/Appearance
Melting Point (°C)584
Theoretical Density (g/cc)8.1
Z Ratio–
E-Beam–
Thermal Evaporation TechniquesBoat:  –
Crucible:  Al2O3
E-Beam Crucible Liner Material–
Temp. (°C) for Given Vap. Press. (Torr)10-4: 250
CommentsDecomposes.

Mercury Sulfide Pellet Evaporation Material

TFM offers high-purity Mercury Sulfide Pellet Evaporation Material, designed for thin-film deposition in infrared detection, optoelectronics, and semiconductor applications. Composed of mercury (Hg) and sulfur (S), this material exhibits unique semiconducting properties, strong infrared absorption, and excellent stability, making it ideal for infrared sensors, photoelectronic devices, and optical coatings.

Optimized for thermal evaporation and electron beam (E-beam) evaporation, Mercury Sulfide Pellet Evaporation Material provides precise film uniformity, strong adhesion, and high purity, ensuring reliable performance in advanced thin-film applications.

Key Features and Advantages

  • Superior Infrared Absorption: Ideal for long-wavelength and mid-wavelength infrared (LWIR & MWIR) detectors.

  • Tunable Bandgap & High Carrier Mobility: Supports infrared optoelectronics, quantum computing, and photonic applications.

  • High Purity & Low Contamination: Ensures uniform thin-film growth for improved device efficiency and longevity.

  • Excellent Chemical & Thermal Stability: Maintains structural integrity under vacuum deposition conditions for consistent thin-film performance.

  • Customizable Stoichiometry: Available in various Hg-S compositions to meet specific research and industrial needs.

Applications

  • Infrared Imaging & Thermal Detection: Used in IR cameras, night vision, and thermal sensors for defense, aerospace, and industrial applications.

  • Optoelectronic & Photodetector Devices: Plays a crucial role in photoelectric conversion, infrared communication, and high-resolution imaging.

  • Semiconductor & Quantum Research: Supports quantum dot technology, topological insulators, and nanoelectronics.

  • Thin-Film Coatings for Optical Systems: Ideal for precision optical coatings in photonic and IR detection devices.

Industry Impact and Customization

TFM’s Mercury Sulfide Pellet Evaporation Material is engineered to support cutting-edge infrared detection, optoelectronics, and semiconductor innovations. With customizable compositions and precision manufacturing, we ensure high-quality thin-film deposition, excellent stoichiometry control, and superior performance for next-generation infrared and photonic technologies.

With its exceptional electronic, optical, and infrared-responsive properties, TFM’s Mercury Sulfide Pellet Evaporation Material is a vital material for high-performance infrared imaging, optoelectronic applications, and advanced semiconductor research, delivering enhanced efficiency and long-term reliability.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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