Thin Film Materials Logo
Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors
molybdenumvi-oxide-evaporation-materials-moo3-1-1

VD0716 Molybdenum(VI) Oxide Evaporation Materials, MoO3

Material Type: Molybdenum Oxide
Symbol: MoO3
Purity: 99.9%
Shape: Powder/ Granule/ Custom-made

Thin-Film Mat Engineering (TFM) is a top-tier manufacturer and supplier of high-purity molybdenum(VI) oxide evaporation materials. Our extensive range includes various evaporation materials, available in both powder and granule forms. For tailored solutions, we also provide custom forms to meet specific requirements. Trust TFM for superior quality and flexibility in your evaporation material needs.

MSDS File

Molybdenum(VI) Oxide Evaporation Materials Overview

Thin-Film Mat Engineering (TFM) offers high-purity molybdenum(VI) oxide evaporation materials with the chemical formula MoO3. Our MoO3 materials are crucial for achieving top-quality deposited films in various deposition processes. With purities reaching up to 99.9995%, TFM ensures exceptional reliability through stringent quality assurance processes.

Related Products

  • Molybdenum Evaporation Materials
  • Oxide Ceramic Evaporation Materials

Specifications for Molybdenum(VI) Oxide Evaporation Materials

Material TypeMolybdenum(VI) Oxide
SymbolMoO3
Color/AppearanceWhite to Pale Yellow
Melting Point795 °C
Theoretical Density 4.69 g/cm3
Thermal Evaporation TechniquesBoat: Mo
Basket: Mo
Crucible: Al2O3, BN
Purity99.9%
ShapePowder/ Pellets/ Granule/ Custom-made

Applications

Molybdenum(VI) oxide evaporation materials are employed in:

  • Deposition processes, including semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD)
  • Optics applications, such as wear protection, decorative coatings, and display technologies

Packaging and Handling

Our molybdenum(VI) oxide evaporation materials are meticulously packaged with clear labeling to facilitate efficient identification and quality control. We ensure that all products are protected from damage during storage and transportation.

Contact Us

TFM is a leading provider of high-purity molybdenum(VI) oxide evaporation materials, available in various forms such as tablets, granules, rods, and wires. We also offer customized shapes and quantities upon request. Additionally, we supply evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For current pricing or inquiries about materials not listed, please contact us directly.

Ordering Table

Material Size Quantity Purity Part Number
Molybdenum Oxide 3MM - 6MM Pieces 25g 99.95% EVMMOO3-6MMA
Molybdenum Oxide 3MM - 6MM Pieces 50g 99.95% EVMMOO3-6MMB
Molybdenum Oxide 3MM - 6MM Pieces 100g 99.95% EVMMOO3-6MMD
Molybdenum Oxide 3MM - 6MM Pieces 200g 99.95% EVMMOO3-6MMH
Molybdenum Oxide 3MM - 6MM Pieces 500 g 99.95% EVMMOO3-6MMT
Material Size Quantity Purity Part Number

Reviews

There are no reviews yet.

Be the first to review “VD0716 Molybdenum(VI) Oxide Evaporation Materials, MoO3”

Your email address will not be published. Required fields are marked *

Related Products

Related products

FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

Shopping Cart
Scroll to Top