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Neodymium Gallate Substrate

Neodymium Gallate Substrate (NdGaO3)

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Neodymium Gallate Substrate (NdGaO₃)

TFM offers high-quality Neodymium Gallate (NdGaO₃) substrates, known for their exceptional lattice matching, high thermal stability, and superior dielectric properties. These substrates are ideal for epitaxial growth of complex oxide materials, making them a popular choice in quantum electronics, superconductivity, and high-performance optoelectronic applications.

NdGaO₃ substrates provide excellent conductivity for the growth of high-quality thin films and are widely used in the fabrication of ferroelectric, piezoelectric, and multiferroic materials. Their high refractive index and transparency in the visible and infrared spectrum also make them suitable for optical and photonic device applications. Additionally, NdGaO₃ substrates are beneficial in oxide electronics, offering low defect density and high quality for advanced research in spintronics and resistive switching devices.

TFM provides customized NdGaO₃ substrates, tailored to meet the rigorous demands of next-generation electronic and photonic devices, ensuring superior material quality and optimal performance in cutting-edge applications.

Key Physical Properties

PropertyValue
MaterialNdGaO₃ (Neodymium Gallate)
StructureOrthorhombic
Lattice Constant (Å)a = 5.43, b = 5.5, c = 7.71
Growth MethodCzochralski
Melting Point1600℃
Density7.57 g/cm³
Permittivityε = 25

Specifications

  • Size: 10×3 mm, 10×5 mm, 10×10 mm, 15×15 mm, 20×20 mm, Dia 15 mm, Dia 20 mm, Dia 1”, Dia 2”
  • Thickness: 0.5 mm, 1.0 mm
  • Polishing: SSP or DSP
  • Orientation: <100>, <110>, <111>
  • Redirection Precision: ±0.5°
  • Edge Redirection: 2° (special 1° available)
  • Angle of Crystalline: Custom sizes and orientations available
  • Surface Roughness (Ra): ≤5Å (5µm × 5µm)

Packaging Details

Neodymium Gallate substrates are carefully packaged in class 100 clean bags or wafer containers within a class 1000 clean room to ensure cleanliness and optimal quality.

Explore high-performance Neodymium Gallate Substrates (NdGaO₃) from TFM for high-quality epitaxial film growth and advanced superconducting and magnetic material applications.

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FAQ

A thin film substrate is the base material upon which thin layers of materials are deposited to create electronic, optical, or mechanical devices. The substrate provides structural support and can influence the properties of the thin film.

The choice of substrate affects the film’s structural integrity, electrical properties, and overall performance. Factors like thermal expansion coefficient, surface smoothness, and chemical compatibility are crucial considerations.

Materials such as lanthanum aluminate (LaAlO₃), magnesium oxide (MgO), and strontium titanate (SrTiO₃) are commonly used due to their lattice compatibility and thermal stability, which are essential for optimal superconducting properties.

Metal substrates offer high electrical and thermal conductivity, making them suitable for applications requiring efficient heat dissipation and electrical connectivity. However, their surface properties and potential for oxidation must be managed during deposition.

These substrates are materials that can support the growth of thin films exhibiting magnetic or ferroelectric properties, essential for applications in memory devices, sensors, and actuators.

Semiconductor substrates, such as silicon wafers, serve as the foundation for integrated circuits and various electronic components, providing the necessary electrical characteristics and structural support for device fabrication.

Gallium Nitride (GaN) substrates are pivotal for high-performance optoelectronic and power devices due to their excellent thermal conductivity, high breakdown voltage, and efficiency. They are widely used in LEDs, power transistors, and RF components.

Halide crystal substrates, composed of halide compounds, are utilized in specialized optical applications, including infrared spectroscopy and laser systems, due to their unique optical properties.
Ceramic substrates provide high thermal stability, mechanical strength, and electrical insulation, making them ideal for high-frequency and high-power applications.
Proper surface preparation, including cleaning and polishing, ensures the removal of contaminants and surface irregularities, leading to improved film adhesion, uniformity, and performance.
Yes, thin films can be deposited on flexible substrates like polymers, enabling the development of flexible electronics and wearable devices. However, challenges include managing mechanical stress and ensuring film adhesion.
Challenges include ensuring lattice matching to minimize defects, managing thermal expansion differences to prevent stress and delamination, and achieving desired electrical and optical properties for specific applications.
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