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nickel-silicide

VD0805 Nickel Silicide Evaporation Materials, NiSi2

Catalog No.VD0805
MaterialNickel Silicide (NiSi2)
Purity99.9%
ShapePowder/ Granule/ Custom-made

TFM excels in manufacturing and supplying high-purity nickel silicide evaporation materials, along with a diverse selection of other evaporation materials. We provide these materials in both powder and granule forms, with options for custom formulations available upon request.

MSDS File

Nickel Silicide Evaporation Materials: Description

Nickel silicide evaporation material, identified by the chemical formula NiSi2, is a high-performance silicide ceramic used in various deposition processes. This material is essential for achieving top-quality films in deposited applications. TFM produces nickel silicide evaporation materials with remarkable purity levels, reaching up to 99.9995%. Our comprehensive quality assurance processes ensure that each product maintains the highest standards of reliability.

Nickel Silicide Evaporation Materials Specification

Material TypeNickel silicide
SymbolNiSi2
Melting Point1,255 °C (2,291 °F; 1,528 K)
Density7.40 g/cm3
Purity99.9%
ShapePowder/ Granule/ Custom-made

Applications of Nickel Silicide Evaporation Materials

Nickel silicide evaporation materials are widely used in deposition techniques such as semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD). They are primarily utilized in optics for applications including wear protection, decorative coatings, and display technologies.

Packaging and Handling

Our nickel silicide evaporation materials are meticulously tagged and labeled to ensure efficient identification and quality control. We take great care to prevent any damage during storage or transportation.

Contact TFM

As a leading provider of high-purity nickel silicide evaporation materials, TFM offers various shapes, including tablets, granules, rods, and wires. Custom forms and quantities are available upon request. Additionally, we supply evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For current pricing and information on other materials, please send us an inquiry.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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