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NB0011 Niobium Crucible, Niobium Cup

Catalog No.NB0011
SizeCylinder Cone and Boat
MaterialR04200 R04210
Purity99.95%
CAS Number7440-03-1
Density8.57 g/cm3
SurfacePolished

Our high-quality niobium crucible & niobium cup is mainly used in the metallurgical industry, chemical industry, machinery processing, glass and ceramic industries. Price competitive!

Niobium Crucible Description

Material:  RO4200, RO4210

Purity: 99.95%

Customized shapes for Niobium crucibles include, but are not limited to, oval, tapered, bottomless, or round mouth.

Niobium Crucible Chemical Composition

Chemical Composition (%)
MaterialMain elements(%)Impurities (Maximum %)
NbFeSiNiWMoTiTaOCHN
RO4200Remainder0.0040.0040.0020.0050.0050.0020.070.0150.00400.00150.003
RO4210Remainder0.010.010.0050.020.010.0040.100.020.010.00150.01

 

Material TypeNiobium
SymbolNb
Atomic Number41
Color/AppearanceGray, Metallic
Melting Point2,468 °C
Density8.57 g/cc

Niobium Crucible Mechanical Requirements (annealed condition)

GradeTensile strength　 δbpsi (MPa), ≥Yield strength　　δ0.2, psi (MPa),≥Elongation in 1″/2″ gage length, %, ≥
>=0.010<0.010
RO4200, RO421018000 (125)12000 (85)2520

Niobium Crucible Packaging

Our high performance Niobium crucibles are wrapped in foam and packaged in plywood cases to ensure safe storage and transportation.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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