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ST0038 Rhodium Sputtering Target, Rh

Chemical Formula: Rh
Catalog Number: ST0038
CAS Number: 7440-16-6
Purity: 99.5%, 99.9%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Rhodium sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Rhodium Sputtering Target Description

RhodiumRhodium sputtering target shares properties with their source material. Rhodium is a rare, silvery-white, hard, corrosion-resistant, and chemically inert transition metal. It is a noble metal and a member of the platinum group. It has only one naturally occurring isotope, 103Rh. Naturally-occurring rhodium is usually found as a free metal, as an alloy with similar metals, and rarely as a chemical compound in minerals such as bowieite and rhodplumsite. It is one of the rarest and most valuable precious metals.

Rhodium Sputtering Target Specification

Material TypeRhodium
SymbolRh
Melting Point 1,966 °C
Color/AppearanceSilvery White Metallic
Theoretical Density12.41 g/cc
SputterDC
Type of BondIndium, Elastomer
CommentsAttacks W source.
Available SizesDia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets; please Contact Us for more information.

Rhodium Sputtering Materials Applications

High-performance rhodium sputtering materials are utilized in various thin film coating applications, including:

  • CD-ROM production
  • Decoration
  • Flat panel displays
  • Functional coatings
  • Optical information storage
  • Glass coating for automotive and architectural glass
  • Optical communications

Other Applications of Rhodium

  • Automotive Industry: The primary use of rhodium is in catalytic converters, where it helps convert harmful unburned hydrocarbons and nitrogen oxide emissions into less harmful gases.
  • Glass Industry: Rhodium is used in the production of flat-panel glass and fiberglass.

Rhodium Sputtering Target Bonding Services

Specialized bonding services for Rhodium Sputtering Targets, including indium and elastomeric bonding techniques, enhance performance and durability. Thin Film Materials (TFM) ensures high-quality solutions that meet industry standards and customer needs.

We also offer custom machining of backing plates, which is essential for sputtering target assembly. This comprehensive approach improves target design flexibility and performance in thin film deposition. Our channels provide detailed information about bonding materials, methods, and services, helping clients make informed decisions.

Rhodium Sputtering Target Packing

Our Rhodium sputtering targets are meticulously handled to prevent damage during storage and transportation, ensuring they retain their original high quality.

Get Contact

TFM offers Rhodium Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

It’s the source material (in solid form) used in sputter deposition to eject atoms or molecules that then form a thin film on a substrate.

Targets can be pure metals (e.g., gold, copper, aluminum), ceramics (e.g., Al₂O₃, SiO₂, TiO₂), alloys, or composites—chosen based on the film’s desired properties.

 

They are produced by processes such as melting/casting for metals or sintering (often with hot isostatic pressing) for ceramics and composite targets to ensure high density and purity.

 

In a vacuum chamber, a plasma (typically argon) bombards the target, ejecting atoms that travel and condense on a substrate, forming a thin film.

 

Key factors include the target’s purity, density, grain structure, and the sputtering yield (i.e. how many atoms are ejected per incident ion), as well as operating conditions like power density and gas pressure.

 

Operators monitor target erosion (often by measuring the depth of the eroded “race track”) or track total energy delivered (kilowatt-hours) until it reaches a threshold that can compromise film quality.

 

Fragile materials (such as many ceramics or certain oxides) and precious metals often require a backing plate to improve cooling, mechanical stability, and to allow thinner targets that reduce material costs.

 

DC sputtering is used for conductive targets, while RF sputtering is necessary for insulating targets (like many oxides) because it prevents charge buildup on the target’s surface.

 

In reactive sputtering, a reactive gas (e.g., oxygen or nitrogen) is introduced to form compound films on the substrate, but it may also “poison” the target surface if not carefully controlled.

 

Many manufacturers prefer to control raw material quality by sourcing their own powders; using external powders can risk impurities and inconsistent target properties.

 

Targets should be stored in clean, dry conditions (often in original packaging or re-wrapped in protective materials) and handled with gloves to avoid contamination, ensuring optimal performance during deposition.

Deposition rate depends on factors such as target material and composition, power density, working gas pressure, substrate distance, and the configuration of the sputtering system (e.g., magnetron design).

 
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