Thin Film Materials Logo
Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors
samariumiii-fluoride-evaporation-materials-smf3-jpg

VD0787 Samarium(III) Fluoride Evaporation Materials, SmF3

Catalog No.VD0787
MaterialSamarium Fluoride (SmF3)
Purity99.9% ~ 99.95%
ShapePowder/ Granule/ Custom-made

TFM is a top manufacturer and supplier of high-purity samarium(III) fluoride evaporation materials. In addition to samarium fluoride, we offer a comprehensive range of evaporation materials to meet a variety of industry needs. Our products are available in both powder and granule forms, providing flexibility for different applications. Custom formulations are also available upon request to meet specific project requirements.

MSDS File

Samarium(III) Fluoride Evaporation Materials by TFM

Samarium(III) fluoride evaporation materials from TFM are fluoride ceramic materials with the chemical formula SmF3. These high-purity SmF3 evaporation materials are crucial in deposition processes, ensuring the production of superior quality thin films. At TFM, we specialize in producing SmF3 evaporation materials with purities reaching up to 99.9995%, supported by stringent quality control measures to guarantee reliability and performance.

Related Products

Samarium(III) Fluoride Evaporation Materials Specification

Material TypeSamarium(III) Fluoride
SymbolSmF3
Appearance/ColorYellow odorless solid
Melting Point1,306 °C (2,383 °F; 1,579 K)
Density6.6 g/cm3 at 20 °C
Purity99.9% ~ 99.95%
ShapePowder/ Granule/ Custom-made

Applications of Samarium(III) Fluoride Evaporation Materials

Samarium(III) fluoride evaporation materials are widely used in deposition processes, such as semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD). Their primary use lies in optics, offering benefits like wear protection, decorative coatings, and enhancements for display technologies.

Packaging of Samarium(III) Fluoride Evaporation Materials

All samarium(III) fluoride evaporation materials from TFM are carefully tagged and labeled to ensure clear identification and robust quality control. Great care is taken during packaging to avoid damage in storage or transit, ensuring the materials arrive in optimal condition.

Get in Touch

TFM is a leading manufacturer and supplier of high-purity samarium(III) fluoride evaporation materials. We offer a variety of forms, including tablets, granules, rods, and wires, with customized shapes and quantities available upon request. TFM also provides a range of evaporation sources, including boats, filaments, crucibles, heaters, and e-beam crucible liners. Contact us for pricing and information on additional materials not listed here.

Reviews

There are no reviews yet.

Be the first to review “VD0787 Samarium(III) Fluoride Evaporation Materials, SmF3”

Your email address will not be published. Required fields are marked *

Related Products

Related products

FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

Shopping Cart
Scroll to Top